Abstract:
There is provided an optical element including: a substrate; and a plurality of microlenses formed on the substrate. A reflecting surface of the microlens is an aspherical surface and asymmetrical with respect to an optical axis of the microlens. A pitch between adjacent ones of the microlenses is 10 to 230 μm. A depth of the microlens is 3.2 to 15.4 μm.
Abstract:
A coded nanostructure has a structure having a number of rows of tracks, each including arrangement of structures formed by protrusions or depressions on a surface of a substrate. Coding is achieved by wobble of the arrangement of the structures in an extending direction of the tracks.
Abstract:
A nanostructure that is visually recognized as being seamless by its more regularly and more uniformly formed fine concave-convex structure and that exhibits an excellent antireflection effect against light in a visible wavelength range is provided. Such a nanostructure is configured by a number of rows of tracks each including structures, formed by protrusions or depressions on a surface of a substrate, arranged at a predetermined fine pitch. In this nanostructure, a distance between centers of the structures adjacent to each other across a strip-shaped portion (seam) in which portions with no structures within the predetermined pitch are continuously formed in a track arrangement direction is adjusted so as to prevent visual recognition of the seam.
Abstract:
An optical device that has an antireflection function, the optical device including: a base; and a plurality of structural bodies, which are formed by convex portions or concave portions, arranged on a surface of the base with a fine pitch that is equal to or smaller than a wavelength of visible light, wherein the plurality of structural bodies are arranged so as to form tracks of a plurality of rows on the surface of the base and form a quasi-hexagonal lattice pattern, a tetragonal lattice pattern, or a quasi-tetragonal lattice pattern, and wherein a packing ratio of the structural bodies to the surface of the base is equal to or higher than 65%.