公开(公告)号：US20220181578A1

公开(公告)日：2022-06-09

申请号：US17435350

申请日：2020-03-06

申请人： DNF CO., LTD

发明人： Myoung Woon KIM ,  Sang Ick LEE ,  Se Jin JANG ,  Sung Gi KIM ,  Jeong Joo PARK ,  Won Mook CHAE ,  A Ra CHO ,  Byeong il YANG ,  Joong Jin PARK ,  Gun Joo PARK ,  Sam Dong LEE ,  Haeng don LIM ,  Sang Yong JEON

IPC分类号： H01L51/52 ,  C23C16/455 ,  C23C16/40 ,  H01L51/56 ,  C23C16/56

摘要： The present invention relates to a silicon oxide encapsulation film comprising a metal or a metal oxide, and a manufacturing method therefor. The silicon metal oxide encapsulation film according to the present invention has a high thin film growth rate and low moisture and oxygen permeabilities, thereby exhibiting a very excellent sealing effect even at a low thickness, and the stress strength and refractive index thereof can be controlled, thereby enabling a high-quality silicon metal oxide encapsulation film that is applicable to a flexible display to be readily manufactured.