Abstract:
A method for making a composite polyamide membrane comprising a porous support and a thin film polyamide layer, wherein the method includes the steps of applying a polar solution comprising a polyfunctional amine monomer and a non-polar solution comprising a polyfunctional acyl halide monomer to a surface of a porous support and interfacially polymerizing the monomers to form a thin film polyamide layer. The method is characterized by including a substituted benzamide monomer within the non-polar solution.
Abstract:
A method for making a composite polyamide membrane including a porous support and a thin film polyamide layer, wherein the method includes the step of applying a polyfunctional amine monomer and a tetraacyl acyl halide monomer represented by Formula (I) to a surface of the porous support and interfacially polymerizing the monomers to form a thin film polyamide layer; wherein A is selected from: oxygen (—O—); carbon (—C—); silicon (—Si—); each of which may be unsubstituted or substituted, e.g. with alkyl groups of 1-4 carbon atoms; or a carbonyl group (—C(O)—), X is the same or different and is selected from a halogen, and Y is selected from halogen and hydroxide.
Abstract:
A method for making a composite polyamide membrane comprising a porous support and a thin film polyamide layer, wherein the method includes the steps of applying a polar solution comprising a polyfunctional amine monomer and a non-polar solution comprising a polyfunctional acyl halide monomer to a surface of a porous support and interfacially polymerizing the monomers to form a thin film polyamide layer. The method is characterized by including a substituted benzamide monomer within the non-polar solution.
Abstract:
A method for making a composite polyamide membrane including a porous support and a thin film polyamide layer, wherein the method includes the step of applying a polyfunctional amine monomer and a tetraacyl acyl halide monomer represented by Formula (I) to a surface of the porous support and interfacially polymerizing the monomers to form a thin film polyamide layer; wherein A is selected from: oxygen (—O—); carbon (—C—); silicon (—Si—); each of which may be unsubstituted or substituted, e.g. with alkyl groups of 1-4 carbon atoms; or a carbonyl group (—C(O)—), X is the same or different and is selected from a halogen, and Y is selected from halogen and hydroxide.