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公开(公告)号：US20130248830A1
公开(公告)日：2013-09-26
申请号：US13804793
申请日：2013-03-14
发明人： Dean M. Welsh , Mark E. Ondari , Moo-Keun Chee , Bong-Ok Kim , Robert D. Froese , Matthew M. Meyer , Hyuck-Joo Kwon , Kyung-Hoon Choi , Young-Jun Cho
CPC分类号： H01L51/0067 , H01L51/0058 , H01L51/0077 , H01L51/0081 , H01L51/508
摘要： The invention provides a film comprising at least two layers, Layer A and Layer B, and wherein Layer(A) is formed from a Composition A comprising at least one compound selected from Formula A: wherein Np is selected from 1-naphthyl or 2-naphthyl, and wherein each R is described herein; and wherein Layer B is formed from a Composition B comprising at least one “HTL compound;” and wherein Layer A is not adjacent to Layer B. The invention also provides a composition comprising at least one compound selected from Formula A: wherein each R is described herein, and wherein the compound has a Tg greater than, or equal to, 115° C.
摘要翻译： 本发明提供一种包含至少两层A，B层的膜，其中层（A）由组合物A形成，所述组合物A包含至少一种选自式A的化合物：其中N p选自1-萘基或2-萘基， 萘基，并且其中每个R在本文中描述; 并且其中层B由包含至少一种“HTL化合物”的组合物B形成; 并且其中层A不与层B相邻。本发明还提供包含至少一种选自式A的化合物的组合物：其中每个R在本文中描述，并且其中该化合物的Tg大于或等于115° C。
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2.发明授权Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist 有权聚合物组合物，包含聚合物组合物的光致抗蚀剂和包含光刻胶的涂覆制品公开(公告)号：US09459533B2
公开(公告)日：2016-10-04
申请号：US13926004
申请日：2013-06-25
CPC分类号： G03F7/0397 , C08F14/185 , G03F7/00 , G03F7/0045 , G03F7/0046
摘要： A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.
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