Apparatus and method for measuring height of protuberances
    2.
    发明申请
    Apparatus and method for measuring height of protuberances 审中-公开
    用于测量突起高度的装置和方法

    公开(公告)号:US20080291468A1

    公开(公告)日:2008-11-27

    申请号:US12068890

    申请日:2008-02-13

    IPC分类号: G01B11/02 G01B11/24

    摘要: The height of protuberances present on the surface of a product, typically a bump wafer, can be measured with a high accuracy irrespective of the state of the upper surfaces of the protuberances. In the signal processor of a bump height measuring apparatus, a bump height measurement area setting section set a bump height measurement area by the bump layout information, a statistical application section averages the height data in an statistical calculation within the measurement area, a contour line calculating section calculates a contour line of a section of the bump, and a bump height determining section determines a peak value in the contour line as the height of the bump.

    摘要翻译: 无论凸起的上表面的状态如何,都可以高精度地测量产品表面上的凸起的高度,通常是凸起晶片。 在凸块高度测量装置的信号处理器中,凸块高度测量区域设置部分通过凸块布局信息设置凸起高度测量区域,统计应用部分在测量区域内的统计计算中平均高度数据,等高线 计算部分计算凸块的一部分的轮廓线,并且凸块高度确定部分确定轮廓线中的峰值作为凸块的高度。