摘要:
A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.
摘要:
A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.
摘要:
An electron beam detection device (34) is arranged on an electron beam passing path so that a beam delay time tB from a passing moment of an electron beam (1) to a moment when the beam reaches a predicted collision point (9a) is longer than a laser delay time tL from a moment when a command for generating laser light (3) is issued to the moment when the laser light reaches the predicted collision point (9a) by at least a predetermined delay time Δt. The device (34) may detect passing therethrough without affecting the electron beam and output a laser light generation command from a laser light command delay circuit (36) when the predetermined delay time Δt (=tB−tL) has elapsed after the detection.
摘要:
A high brightness X-ray generator and a high brightness X-ray generating method are provided which are able to promote an increase in X-ray brightness (i.e., an increase in an X-ray output) while suppressing an excessive increase in the cost of optical elements such as a laser unit, a mirror, and a lens. A high brightness X-ray generator generates an X-ray by inverse Compton scattering by colliding an electron beam with pulse laser light. There are provided a plurality of pulse laser units (32A, 32B) which emits a plurality of pulse laser lights (3a, 3b ) in predetermined periods, an optical-path matching unit (34) which matches optical paths of the plurality of pulse laser lights, and a timing control unit (40) which controls timings of the optical-path matching unit and the pulse laser units, wherein the plurality of pulse laser lights is emitted from the same optical path at different timings.
摘要:
An electron beam detection device (34) is arranged on an electron beam passing path so that a beam delay time tB from a passing moment of an electron beam (1) to a moment when the beam reaches a predicted collision point (9a) is longer than a laser delay time tL from a moment when a command for generating laser light (3) is issued to the moment when the laser light reaches the predicted collision point (9a) by at least a predetermined delay time Δt. The device (34) may detect passing therethrough without affecting the electron beam and output a laser light generation command from a laser light command delay circuit (36) when the predetermined delay time Δt (=tB−tL) has elapsed after the detection.
摘要:
A high brightness X-ray generator and a high brightness X-ray generating method are provided which are able to promote an increase in X-ray brightness (i.e., an increase in an X-ray output) while suppressing an excessive increase in the cost of optical elements such as a laser unit, a mirror, and a lens. A high brightness X-ray generator generates an X-ray by inverse Compton scattering by colliding an electron beam with pulse laser light. There are provided a plurality of pulse laser units (32A, 32B) which emits a plurality of pulse laser lights (3a, 3b) in predetermined periods, an optical-path matching unit (34) which matches optical paths of the plurality of pulse laser lights, and a timing control unit (40) which controls timings of the optical-path matching unit and the pulse laser units, wherein the plurality of pulse laser lights is emitted from the same optical path at different timings.
摘要:
An X-ray waveform is generated by validating detection data corresponding to when an X-ray (4) is generated at a collision point (9) among X-ray detection data and invalidating other data. For example, when laser light (3) is pulse laser light and an electron beam (1) is a continuous electron beam or a pulse-like electron beam having a pulse width equal to or greater than that of the pulse laser light, the X-ray waveform is generated by detecting the laser light (3) and multiplying the X-ray detection data by laser light detection data after making time axes coincident with respect to the collision point (9).
摘要:
An X-ray waveform is generated by validating detection data corresponding to when an X-ray (4) is generated at a collision point (9) among X-ray detection data and invalidating other data. For example, when laser light (3) is pulse laser light and an electron beam (1) is a continuous electron beam or a pulse-like electron beam having a pulse width equal to or greater than that of the pulse laser light, the X-ray waveform is generated by detecting the laser light (3) and multiplying the X-ray detection data by laser light detection data after making time axes coincident with respect to the collision point (9).
摘要:
A device for measuring profiles of an electron beam and a laser beam is provided with a profile measuring device 30 for measuring cross-section profiles of the beams in the vicinity of a collision position where an electron beam 1 and a laser beam 3 are brought into frontal collision, and a moving device 40 for continuously moving the profile measuring device in a predetermined direction which substantially coincides with the axial directions of the beams. Furthermore, based on the cross-section profiles measured by the profile measuring device, the position of the profile measuring device in the predetermined direction, and the oscillation timings of the beams, temporal changes in three-dimensional profiles of the electron beam and the laser beam are created by a profile creating device 50.
摘要:
A device for measuring profiles of an electron beam and a laser beam is provided with a profile measuring device 30 for measuring cross-section profiles of the beams in the vicinity of a collision position where an electron beam 1 and a laser beam 3 are brought into frontal collision, and a moving device 40 for continuously moving the profile measuring device in a predetermined direction which substantially coincides with the axial directions of the beams. Furthermore, based on the cross-section profiles measured by the profile measuring device, the position of the profile measuring device in the predetermined direction, and the oscillation timings of the beams, temporal changes in three-dimensional profiles of the electron beam and the laser beam are created by a profile creating device 50.