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1.
公开(公告)号:US07867302B2
公开(公告)日:2011-01-11
申请号:US11063258
申请日:2005-02-22
申请人: Damien Nevoret , Gwo Swei , Alain Zanoli
发明人: Damien Nevoret , Gwo Swei , Alain Zanoli
CPC分类号: B24D11/001 , B24D18/00 , B33Y30/00 , B33Y80/00
摘要: A method of facilitating abrasive article manufacturing includes providing a rapid tooling system to a consumer and providing a cartridge to the consumer. The cartridge has a cartridge body, a first binder and first abrasive particles. The cartridge is configured to operate as part of the rapid tooling system and is operable to deposit the first binder and the first abrasive particles in successive patterned layers to form an abrasive structure.
摘要翻译: 一种促进磨料制品制造的方法包括向消费者提供快速加工系统并向消费者提供药筒。 盒具有盒体,第一粘合剂和第一磨料颗粒。 盒被配置为作为快速加工系统的一部分操作,并且可操作地将第一粘合剂和第一磨料颗粒沉积在连续的图案化层中以形成研磨结构。
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2.
公开(公告)号:US20060185257A1
公开(公告)日:2006-08-24
申请号:US11062900
申请日:2005-02-22
申请人: Damien Nevoret , Gwo Swei , Alain Zanoli
发明人: Damien Nevoret , Gwo Swei , Alain Zanoli
IPC分类号: C09K3/14
CPC分类号: B24D18/00 , B24D11/001 , B33Y30/00 , B33Y40/00
摘要: A rapid structuring media cartridge includes a cartridge body, a first binder and first abrasive particles. The cartridge is operable to deposit successive patterned layers including the first binder and first abrasive particles to form an abrasive structure.
摘要翻译: 快速构造的介质盒包括盒体,第一粘合剂和第一磨料颗粒。 墨盒可操作以沉积包括第一粘合剂和第一磨料颗粒的连续图案层以形成研磨结构。
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3.
公开(公告)号:US07524345B2
公开(公告)日:2009-04-28
申请号:US11062904
申请日:2005-02-22
申请人: Damien Nevoret , Gwo Swei , Alain Zanoli
发明人: Damien Nevoret , Gwo Swei , Alain Zanoli
IPC分类号: C09K3/14
CPC分类号: B24D5/00 , B24D7/00 , B24D11/00 , B24D18/00 , B24D2203/00 , B33Y30/00 , B33Y80/00 , Y10T442/611
摘要: A coated abrasive article includes a substrate and a patterned set of abrasive structures. Each abrasive structure of the patterned set of abrasive structures has an engineered microfeature.
摘要翻译: 涂覆的磨料制品包括基底和图案化的一组研磨结构。 图案化的磨料结构体的每个研磨结构具有工程化的微特征。
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公开(公告)号:US20060185256A1
公开(公告)日:2006-08-24
申请号:US11062904
申请日:2005-02-22
申请人: Damien Nevoret , Gwo Swei , Alain Zanoli
发明人: Damien Nevoret , Gwo Swei , Alain Zanoli
CPC分类号: B24D5/00 , B24D7/00 , B24D11/00 , B24D18/00 , B24D2203/00 , B33Y30/00 , B33Y80/00 , Y10T442/611
摘要: A coated abrasive article includes a substrate and a patterned set of abrasive structures. Each abrasive structure of the patterned set of abrasive structures has an engineered microfeature.
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5.
公开(公告)号:US20060185255A1
公开(公告)日:2006-08-24
申请号:US11063258
申请日:2005-02-22
申请人: Damien Nevoret , Gwo Swei , Alain Zanoli
发明人: Damien Nevoret , Gwo Swei , Alain Zanoli
CPC分类号: B24D11/001 , B24D18/00 , B33Y30/00 , B33Y80/00
摘要: A method of facilitating abrasive article manufacturing includes providing a rapid tooling system to a consumer and providing a cartridge to the consumer. The cartridge has a cartridge body, a first binder and first abrasive particles. The cartridge is configured to operate as part of the rapid tooling system and is operable to deposit the first binder and the first abrasive particles in successive patterned layers to form an abrasive structure.
摘要翻译: 一种促进磨料制品制造的方法包括向消费者提供快速加工系统并向消费者提供药筒。 盒具有盒体,第一粘合剂和第一磨料颗粒。 盒被配置为作为快速加工系统的一部分操作,并且可操作地将第一粘合剂和第一磨料颗粒沉积在连续的图案化层中以形成研磨结构。
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公开(公告)号:US20050085167A1
公开(公告)日:2005-04-21
申请号:US10688833
申请日:2003-10-17
申请人: Gwo Swei , Damien Nevoret , Patrick Yang
发明人: Gwo Swei , Damien Nevoret , Patrick Yang
CPC分类号: B24D3/342
摘要: An antiloading composition includes a first organic compound. The compound has a water contact angle criterion that is less than a water contact angle for zinc stearate. The first compound also satisfies at least one condition selected from the group consisting of a melting point Tmelt greater than about 40° C, a coefficient of friction F less than about 0.3, and an antiloading criterion P greater than about 0.3. Another embodiment includes a second organic compound, having a different water contact angle from that of the first organic compound. The composition has a particular water contact angle W°p that is determined, at least in part, by the independent W°g of each compound and the proportion of each compound in the composition. Also, an abrasive product includes the antiloading composition. A method of grinding a substrate is disclosed that includes employing effective amount of an antiloading composition. Further disclosed is a method of selecting an antiloading compound.
摘要翻译: 抗载组合物包括第一有机化合物。 该化合物的水接触角标准小于硬脂酸锌的水接触角。 第一种化合物还满足选自熔点大于约40℃,摩擦系数F小于约0.3的至少一种条件,并且抗加载标准P更大 比约0.3。 另一个实施方案包括具有与第一有机化合物的水接触角不同的第二有机化合物。 该组合物具有至少部分地由每种化合物的独立W 0 SUB>和每种化合物的比例确定的特定水接触角W°P 组成。 而且,研磨产品包括抗压组合物。 公开了一种研磨基材的方法,其包括使用有效量的抗压组合物。 进一步公开了选择抗负载化合物的方法。
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公开(公告)号:US20060260208A1
公开(公告)日:2006-11-23
申请号:US11492614
申请日:2006-07-24
申请人: Gwo Swei , Damien Nevoret , Patrick Yang
发明人: Gwo Swei , Damien Nevoret , Patrick Yang
CPC分类号: B24D3/342
摘要: An antiloading composition includes a first organic compound. The compound has a water contact angle criterion that is less than a water contact angle for zinc stearate. The first compound also satisfies at least one condition selected from the group consisting of a melting point Tmelt greater than about 40° C., a coefficient of friction F less than about 0.3, and an antiloading criterion P greater than about 0.3. Another embodiment includes a second organic compound, having a different water contact angle from that of the first organic compound. The composition has a particular water contact angle Wop that is determined, at least in part, by the independent Wog of each compound and the proportion of each compound in the composition. Also, an abrasive product includes the antiloading composition. A method of grinding a substrate is disclosed that includes employing effective amount of an antiloading composition. Further disclosed is a method of selecting an antiloading compound.
摘要翻译: 抗载组合物包括第一有机化合物。 该化合物的水接触角标准小于硬脂酸锌的水接触角。 第一种化合物还满足选自熔点大于约40℃,摩擦系数F小于约0.3的至少一种条件,以及抗加载标准P 大于约0.3。 另一个实施方案包括具有与第一有机化合物的水接触角不同的第二有机化合物。 该组合物具有至少部分地由独立的W o O g确定的特定的水接触角W o o P o 每种化合物的比例和每种化合物在组合物中的比例。 而且,研磨产品包括抗压组合物。 公开了一种研磨基材的方法,其包括使用有效量的抗压组合物。 进一步公开了选择抗负载化合物的方法。
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公开(公告)号:US20070173180A1
公开(公告)日:2007-07-26
申请号:US11726848
申请日:2007-03-23
申请人: Gwo Swei , Damien Nevoret , Patrick Yang
发明人: Gwo Swei , Damien Nevoret , Patrick Yang
IPC分类号: B24D3/02
CPC分类号: B24D3/342
摘要: An antiloading composition includes a first organic compound. The compound has a water contact angle criterion that is less than a water contact angle for zinc stearate. The first compound also satisfies at least one condition selected from the group consisting of a melting point Tmelt greater than about 40° C., a coefficient of friction F less than about 0.3, and an antiloading criterion P greater than about 0.3. Another embodiment includes a second organic compound, having a different water contact angle from that of the first organic compound. The composition has a particular water contact angle W°p that is determined, at least in part, by the independent W°g of each compound and the proportion of each compound in the composition. Also, an abrasive product includes the antiloading composition. A method of grinding a substrate is disclosed that includes employing effective amount of an antiloading composition. Further disclosed is a method of selecting an antiloading compound.
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公开(公告)号:US20070169420A1
公开(公告)日:2007-07-26
申请号:US11726849
申请日:2007-03-23
申请人: Gwo Swei , Damien Nevoret , Patrick Yang
发明人: Gwo Swei , Damien Nevoret , Patrick Yang
CPC分类号: B24D3/342
摘要: An antiloading composition includes a first organic compound. The compound has a water contact angle criterion that is less than a water contact angle for zinc stearate. The first compound also satisfies at least one condition selected from the group consisting of a melting point Tmelt greater than about 40° C., a coefficient of friction F less than about 0.3, and an antiloading criterion P greater than about 0.3. Another embodiment includes a second organic compound, having a different water contact angle from that of the first organic compound. The composition has a particular water contact angle W°p that is determined, at least in part, by the independent W°g of each compound and the proportion of each compound in the composition. Also, an abrasive product includes the antiloading composition. A method of grinding a substrate is disclosed that includes employing effective amount of an antiloading composition. Further disclosed is a method of selecting an antiloading compound.
摘要翻译: 抗载组合物包括第一有机化合物。 该化合物的水接触角标准小于硬脂酸锌的水接触角。 第一种化合物还满足选自熔点大于约40℃,摩擦系数F小于约0.3的至少一种条件,以及抗加载标准P 大于约0.3。 另一个实施方案包括具有与第一有机化合物的水接触角不同的第二有机化合物。 该组合物具有至少部分地由每种化合物的独立W 0 SUB>和每种化合物的比例确定的特定水接触角W°P 组成。 而且,研磨产品包括抗压组合物。 公开了一种研磨基材的方法,其包括使用有效量的抗压组合物。 进一步公开了选择抗负载化合物的方法。
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公开(公告)号:US20060288649A1
公开(公告)日:2006-12-28
申请号:US11513696
申请日:2006-08-31
申请人: Paul Wei , Gwo Swei , Damien Nevoret , Wenliang Yang
发明人: Paul Wei , Gwo Swei , Damien Nevoret , Wenliang Yang
CPC分类号: B24D11/001 , B24D3/28 , B24D2203/00
摘要: A coated abrasive product is disclosed, which includes a substrate and an abrasive layer overlying the substrate. The abrasive layer includes abrasive grains and a binder, the binder being formed from a binder formulation having first and second binder components mixed together uniformly with the abrasive grains, wherein the first binder component is radiation curable and the second binder component comprises a powder and is thermally curable.
摘要翻译: 公开了一种涂覆的磨料产品,其包括衬底和覆盖衬底的磨料层。 研磨层包括磨料颗粒和粘合剂,粘合剂由粘合剂制剂形成,该粘合剂制剂具有与磨粒一起混合在一起的第一和第二粘合剂组分,其中第一粘合剂组分是可辐射固化的,第二粘合剂组分包含粉末, 热固化。
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