公开(公告)号：US07708868B2

公开(公告)日：2010-05-04

申请号：US11443232

申请日：2006-05-30

申请人： David B. Smathers ,  Melvin K. Holcomb ,  Eric Land

发明人： David B. Smathers ,  Melvin K. Holcomb ,  Eric Land

IPC分类号： B23K20/00 ,  B21D22/16 ,  C23C14/32

CPC分类号： C23C14/3407 ,  H01J37/3423 ,  H01J37/3491

摘要： A variable thickness sputtering target which increases the target material thickness at strategic locations to greatly improve the yield of usable wafers per target, and a method of manufacturing such target comprising forming a generally flat and circularly shaped target blank so that a thickness dimension between the top and bottom surfaces decreases as a function of radius of the target blank. The variable thickness target blank is then formed into a variable thickness dome shaped target member having a bottom portion and a sidewall portion, wherein a wall thickness of said variable thickness dome-shaped target member is thickest proximate a center portion of said bottom portion. In one embodiment of the invention, the variable thickness target blank is formed by clock rolling (or compression rolling) the target blank with crowned rolls to obtain a variable thickness target blank.

摘要翻译： 一种可变厚度溅射靶，其在战略位置增加目标材料厚度，以大大提高每个靶材的可用晶片的产量，以及制造这种靶材的方法，包括形成大致平坦且圆形的靶坯料，使得顶部之间的厚度尺寸 并且底面随目标空白半径的函数而减小。 然后将可变厚度目标坯料形成为具有底部和侧壁部分的可变厚度的圆顶形目标构件，其中所述可变厚度的圆顶形目标构件的壁厚在所述底部的中心部分附近最厚。 在本发明的一个实施例中，可变厚度目标坯料通过用加盖辊轧制（或压缩）目标坯料来形成，以获得可变厚度目标坯料。

公开(公告)号：US20070007131A1

公开(公告)日：2007-01-11

申请号：US11443232

申请日：2006-05-30

申请人： David Smathers ,  Melvin Holcomb ,  Eric Land

发明人： David Smathers ,  Melvin Holcomb ,  Eric Land

IPC分类号： C23C14/00

CPC分类号： C23C14/3407 ,  H01J37/3423 ,  H01J37/3491

摘要： A variable thickness sputtering target which increases the target material thickness at strategic locations to greatly improve the yield of usable wafers per target, and a method of manufacturing such target comprising forming a generally flat and circularly shaped target blank so that a thickness dimension between the top and bottom surfaces decreases as a function of radius of the target blank. The variable thickness target blank is then formed into a variable thickness dome shaped target member having a bottom portion and a sidewall portion, wherein a wall thickness of said variable thickness dome-shaped target member is thickest proximate a center portion of said bottom portion. In one embodiment of the invention, the variable thickness target blank is formed by clock rolling (or compression rolling) the target blank with crowned rolls to obtain a variable thickness target blank.

摘要翻译： 一种可变厚度溅射靶，其在战略位置增加目标材料厚度，以大大提高每个靶材的可用晶片的产量，以及制造这种靶材的方法，包括形成大致平坦且圆形的靶坯料，使得顶部之间的厚度尺寸 并且底面随目标空白半径的函数而减小。 然后将可变厚度目标坯料形成为具有底部和侧壁部分的可变厚度的圆顶形目标构件，其中所述可变厚度的圆顶形目标构件的壁厚在所述底部的中心部分附近最厚。 在本发明的一个实施例中，可变厚度目标坯料通过用加盖辊轧制（或压缩）目标坯料来形成，以获得可变厚度目标坯料。