公开(公告)号：US06332831B1

公开(公告)日：2001-12-25

申请号：US09544287

申请日：2000-04-06

申请人： David M. Shemo ,  W. S. Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. S. Rader ,  Toshiki Owaki

IPC分类号： B24B100

CPC分类号： C09K3/1463 ,  C09G1/02

摘要： A polishing composition for a memory hard disk, which comprises at least the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one periodate selected from the group consisting of periodic acid, potassium periodate, sodium periodate and lithium periodate, (c) a buffer component to adjust the pH of the polishing composition to a range of from 2 to 5, and (d) water.

摘要翻译： 一种用于存储硬盘的抛光组合物，其至少包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂 来自由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.001至10重量％的至少一种 选自高碘酸，高碘酸钾，高碘酸钠和高碘酸锂的高碘酸盐，（c）将抛光组合物的pH调节至2至5的范围的缓冲组分，和（d）水。