公开(公告)号：US06332831B1

公开(公告)日：2001-12-25

申请号：US09544287

申请日：2000-04-06

申请人： David M. Shemo ,  W. S. Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. S. Rader ,  Toshiki Owaki

IPC分类号： B24B100

CPC分类号： C09K3/1463 ,  C09G1/02

摘要： A polishing composition for a memory hard disk, which comprises at least the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one periodate selected from the group consisting of periodic acid, potassium periodate, sodium periodate and lithium periodate, (c) a buffer component to adjust the pH of the polishing composition to a range of from 2 to 5, and (d) water.

摘要翻译： 一种用于存储硬盘的抛光组合物，其至少包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂 来自由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.001至10重量％的至少一种 选自高碘酸，高碘酸钾，高碘酸钠和高碘酸锂的高碘酸盐，（c）将抛光组合物的pH调节至2至5的范围的缓冲组分，和（d）水。

公开(公告)号：US06280490B1

公开(公告)日：2001-08-28

申请号：US09405222

申请日：1999-09-27

申请人： W. Scott Rader ,  David M. Shemo ,  Toshiki Owaki

发明人： W. Scott Rader ,  David M. Shemo ,  Toshiki Owaki

IPC分类号： C09K314

CPC分类号： C09K3/1463 ,  G11B5/8404

摘要： A polishing composition for a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one iron salt selected from the group consisting of iron nitrate, iron sulfate, ammonium iron sulfate, iron perchlorate, iron chloride, iron citrate, ammonium iron titrate, iron oxalate, ammonium iron oxalate and an iron chelate complex salt of ethylenediaminetetraacetic acid, (c) from 0.01 to 30 wt %, based on the total amount of the polishing composition, of at least one peroxydisulfate salt selected from the group consisting of ammonium peroxydisulfate, potassium peroxydisulfate and sodium peroxydisulfate, and (d) water.

摘要翻译： 一种用于存储硬盘的抛光组合物，其包含以下组分（a）至（d）：（a））：0.1至50重量％，基于抛光组合物的总量，选自 由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量，0.001至10重量％的至少一种铁盐 选自硝酸铁，硫酸铁，硫酸铁铵，高氯酸铁，氯化铁，柠檬酸铁，滴定铁，草酸铁，草酸铁铵和乙二胺四乙酸的铁螯合络合物，（c）0.01 至少30重量％，基于抛光组合物的总量，选自过氧化二硫酸铵，过二硫酸钾和过氧化二硫酸钠中的至少一种过氧化二硫酸盐，和（d）水。

公开(公告)号：US06328774B1

公开(公告)日：2001-12-11

申请号：US09511910

申请日：2000-02-23

申请人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

IPC分类号： C09K314

CPC分类号： C09K3/1463 ,  C09G1/02

摘要： A polishing composition for a memory hard disk, which comprises at least the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one periodate selected from the group consisting of periodic acid, potassium periodate, sodium periodate and lithium periodate, (c) from 0.01 to 30 wt %, based on the total amount of the polishing composition, of at least one peroxydisulfate salt selected from the group consisting of ammonium peroxydisulfate, potassium peroxydisulfate and sodium peroxydisulfate, and (d) water, and which has a pH of from 2 to 7.

摘要翻译： 一种用于存储硬盘的抛光组合物，其至少包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂 来自由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.001至10重量％的至少一种 选自高碘酸，高碘酸钾，高碘酸钠和高碘酸锂的高碘酸盐，（c）基于抛光组合物的总量，0.01至30重量％的至少一种选自以下的过氧化二硫酸盐： 的过二硫酸铵，过二硫酸钾和过氧二硫酸钠，和（d）水，pH为2〜7。

公开(公告)号：US06258140B1

公开(公告)日：2001-07-10

申请号：US09404993

申请日：1999-09-27

申请人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

IPC分类号： C09G102

CPC分类号： C09K3/1463 ,  G11B5/8404

摘要： A polishing composition for polishing a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.0001 to 3.0 wt %, based on the total amount of the polishing composition, of at least one polishing resistance-reducing agent selected from the group consisting of a surfactant, a water-soluble polymer and a polyelectrolyte, (c) from 0.001 to 40 wt %, based on the total amount of the polishing composition, of at least one polishing accelerator selected from the group consisting of an inorganic acid, an organic acid and their aluminum, iron, nickel and cobalt salts, and (d) water.

摘要翻译： 一种用于抛光存储硬盘的抛光组合物，其包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂，其选自 由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.0001至3.0重量％的至少一种抛光 选自表面活性剂，水溶性聚合物和聚电解质的抗降低剂，（c）基于抛光组合物的总量，0.001至40重量％的至少一种抛光促进剂，其选自 由无机酸，有机酸及其铝，铁，镍和钴盐组成的组，和（d）水。

公开(公告)号：US08425042B2

公开(公告)日：2013-04-23

申请号：US12851969

申请日：2010-08-06

申请人： Curtis R. Hruska ,  David M. Shemo ,  Kim Leong Tan

发明人： Curtis R. Hruska ,  David M. Shemo ,  Kim Leong Tan

IPC分类号： G03B21/00

CPC分类号： G02B27/26 ,  G02B26/008 ,  G02B27/286

摘要： A multi-segment optical retarder that can be used with or within a single projector for creating 3D images. The multi-segment optical retarder is coupled to an actuator used to effect some predetermined linear, rotary, or oscillating movement of the multi-segment optical retarder such that a fast axis orientation of each segment is substantially constant relative to itself over time and for a given area of incidence.

摘要翻译： 可以与单个投影机一起使用或用于创建3D图像的多段光学延迟器。 多段光学延迟器耦合到用于实现多段光学延迟器的某些预定的线性，旋转或振荡运动的致动器，使得每个段的快速轴取向在时间上相对于其自身基本恒定，并且对于 给定发病面积。

公开(公告)号：US20100066929A1

公开(公告)日：2010-03-18

申请号：US12556694

申请日：2009-09-10

申请人： David M. Shemo ,  Scott McEldowney

发明人： David M. Shemo ,  Scott McEldowney

IPC分类号： G02F1/1335 ,  G03F7/20

CPC分类号： G02B5/3083

摘要： A micro-array of optical vortex retarders is provided by forming an alignment layer having a plurality of discrete alignment patches with different orientations. A layer of birefringent material, including one of a liquid crystal and a liquid crystal polymer precursor material, is provided adjacent to the alignment layer. The aligning orientation and position of each discrete alignment patch in the plurality of discrete alignment patches is selected to induce the layer of birefringent material to form at least one optical vortex retarder adjacent to a substantially non-oriented region of the alignment layer.

摘要翻译： 通过形成具有不同取向的多个离散对准贴片的取向层来提供光学涡旋延迟器的微阵列。 在取向层附近设置包括液晶和液晶聚合物前体材料之一的双折射材料层。 选择多个离散对准贴片中的每个离散对准贴片的对准方向和位置以诱导双折射材料层，以形成与取向层的基本上非取向区域相邻的至少一个光学涡旋延迟器。

公开(公告)号：US20090009668A1

公开(公告)日：2009-01-08

申请号：US12166988

申请日：2008-07-02

申请人： Kim Leong Tan ,  David M. Shemo

发明人： Kim Leong Tan ,  David M. Shemo

IPC分类号： G02F1/13 ,  G03H1/02

CPC分类号： G02B5/3016 ,  G02B5/1871 ,  G02B5/32 ,  G02F1/13342 ,  G02F1/133753 ,  G02F2203/07 ,  G03H2240/11 ,  G03H2240/23 ,  G03H2250/38 ,  G11B7/1353 ,  G11B7/13925 ,  G11B2007/0006

摘要： A polarization-selective diffractive optical element includes a liquid crystal polymer film supported by a substrate. The liquid crystal polymer film includes an array of pixels, each pixel encoded with a fixed liquid crystal director such that each liquid crystal director is aligned in a common plane perpendicular to the liquid crystal polymer film and provides a predetermined pattern of out-of-plane tilts. A size of the pixels in the array and the predetermined pattern are selected such that the liquid crystal polymer film forms a phase hologram for diffracting light polarized parallel to said common plane and a zeroth order diffraction grating for light polarized perpendicular to the said common plane. The non-etched and flat phase hologram is suitable for a wide range of applications.

摘要翻译： 偏振选择性衍射光学元件包括由衬底支撑的液晶聚合物膜。 液晶聚合物膜包括像素阵列，每个像素用固定的液晶指示器编码，使得每个液晶指向矢在垂直于液晶聚合物膜的公共平面中排列，并提供预定的平面外的图案 倾斜 选择阵列中的像素和预定图案的大小，使得液晶聚合物膜形成用于衍射平行于所述公共平面的光的相位全息图和用于垂直于所述公共平面偏振的光的零级衍射光栅。 非蚀刻和平面相位全息图适用于广泛的应用。

公开(公告)号：US06355075B1

公开(公告)日：2002-03-12

申请号：US09502336

申请日：2000-02-11

申请人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

发明人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

IPC分类号： C09K314

CPC分类号： C09G1/02

摘要： A polishing composition comprising an abrasive, an anticorrosive, an oxidizing agent, an acid, a pH regulator and water and having a pH within a range of from 2 to 5, wherein the abrasive is colloidal silica or fumed silica, and its primary particle size is at most 20 nm.

摘要翻译： 一种抛光组合物，其包含研磨剂，防腐蚀剂，氧化剂，酸，pH调节剂和水，并且pH在2至5的范围内，其中所述研磨剂是胶体二氧化硅或热解法二氧化硅，其初级粒度 至多为20nm。

公开(公告)号：US08373810B2

公开(公告)日：2013-02-12

申请号：US12556694

申请日：2009-09-10

申请人： David M. Shemo ,  Scott McEldowney

发明人： David M. Shemo ,  Scott McEldowney

IPC分类号： G02F1/1335 ,  G02F1/135 ,  G02F1/1337 ,  G02F1/13 ,  H01L21/00

CPC分类号： G02B5/3083

摘要： A micro-array of optical vortex retarders is provided by forming an alignment layer having a plurality of discrete alignment patches with different orientations. A layer of birefringent material, including one of a liquid crystal and a liquid crystal polymer precursor material, is provided adjacent to the alignment layer. The aligning orientation and position of each discrete alignment patch in the plurality of discrete alignment patches is selected to induce the layer of birefringent material to form at least one optical vortex retarder adjacent to a substantially non-oriented region of the alignment layer.

摘要翻译： 通过形成具有不同取向的多个离散对准贴片的取向层来提供光学涡旋延迟器的微阵列。 在取向层附近设置包括液晶和液晶聚合物前体材料之一的双折射材料层。 选择多个离散对准贴片中的每个离散对准贴片的对准方向和位置以诱导双折射材料层，以形成与取向层的基本上非取向区域相邻的至少一个光学涡旋延迟器。

公开(公告)号：US20110027494A1

公开(公告)日：2011-02-03

申请号：US12852105

申请日：2010-08-06

申请人： Kim Leong TAN ,  David M. Shemo

发明人： Kim Leong TAN ,  David M. Shemo

IPC分类号： C08F2/48

CPC分类号： G02B5/3016 ,  B29D11/0074 ,  G02B5/1871 ,  G02B5/32 ,  G02F1/13342 ,  G02F1/133753 ,  G02F2203/07 ,  G03H1/22 ,  G03H2001/2276 ,  G03H2240/11 ,  G03H2240/23 ,  G03H2250/38 ,  G11B7/1353 ,  G11B7/13925 ,  G11B2007/0006

摘要： A method of fabricating an optical element including a liquid crystal layer having a spatially-varying tilt angle includes coating a substrate with a linearly photopolymerizable polymer layer, irradiating the linearly photopolymerizable polymer layer with linearly polarized ultra-violet light at a oblique angle, and coating a layer of liquid crystal material on a surface of the irradiated linearly photopolymerizable polymer layer. The liquid crystal material has a predetermined relationship between its tilt angle and a total dose of the linearly polarized ultra-violet light. The linearly photopolymerizable polymer layer is irradiated with at least one dose of linearly polarized ultra-violet light that is sufficient to induce formation of a plurality of discrete regions within the liquid crystal layer having a larger in-plane birefringence than an adjacent or surrounding region.

摘要翻译： 制造包括具有空间变化倾斜角的液晶层的光学元件的方法包括用线性可光聚合的聚合物层涂覆基板，以线性偏振的紫外线以倾斜的角度照射线性可光聚合的聚合物层， 在被照射线性可光聚合聚合物层的表面上的一层液晶材料。 液晶材料的倾斜角与线偏振紫外光的总剂量之间具有预定的关系。 线性可光聚合聚合物层被照射至少一种线性偏振紫外光，其量足以引起在相邻或周围区域内具有较大面内双折射的液晶层内形成多个离散区域。