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公开(公告)号：US5322630A
公开(公告)日：1994-06-21
申请号：US962494
申请日：1992-10-15
申请人： Dennis A. Williams , James R. Looney , Daniel S. Sullivan , Brent I. Bourland , John A. Haslegrave , Paul J. Clewlow , Niall Carruthers , Terence M. O'Brien
发明人： Dennis A. Williams , James R. Looney , Daniel S. Sullivan , Brent I. Bourland , John A. Haslegrave , Paul J. Clewlow , Niall Carruthers , Terence M. O'Brien
CPC分类号： C09K8/74 , C09K8/54 , C23F11/04 , Y10S507/939
摘要： A method of acidizing a subterranean formation with an acqueous acid solution wherein the acid solution contains corrosion inhibiting amounts of an amine derivative prepared by reacting an unsaturated carboxylic acid with (a) fatty amine or polyamine, or (b) a fatty amido amine or polyamine, or (c) a fatty imidazoline amine or polyamine. The derivative is characterized by the absence of primary amino groups, and preferably contains only tertiary amino groups.
摘要翻译： 一种用酸水溶液酸化地层的方法，其中酸溶液含有腐蚀抑制量的不饱和羧酸与（a）脂肪胺或多胺反应制备的胺衍生物，或（b）脂肪酰胺基胺或多胺 ，或（c）脂肪咪唑啉胺或多胺。 该衍生物的特征在于不存在伯氨基，并且优选仅含有叔氨基。
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公开(公告)号：US5209859A
公开(公告)日：1993-05-11
申请号：US835704
申请日：1992-02-12
CPC分类号： C09K8/54 , C23F11/04 , Y10S507/934
摘要： An acid system for acidizing wells contains corrosion inhibitor additives which consist essentially of a metal selected from antimony and antimony mixtures, a quaternary compound, and a surfactant. The corrosion inhibitor is free of toxic acetylenic compounds.
摘要翻译： 用于酸化井的酸性体系包含腐蚀抑制剂添加剂，其基本上由选自锑和锑混合物的金属，季铵化合物和表面活性剂组成。 腐蚀抑制剂不含有毒的炔属化合物。
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公开(公告)号：US5089153A
公开(公告)日：1992-02-18
申请号：US494673
申请日：1990-03-16
CPC分类号： C23F11/04 , C09K8/54 , Y10S166/902 , Y10S507/934
摘要： Corrosion inhibitor additives are added directly to an aqueous acid solution used in acidizing subterranean formations. The additives consist essentially of a metal selected from antimony and antimony mixtures, a quaternary compound, and a surfactant. The corrosion inhibitor is free of toxic acetylenic compounds.
摘要翻译： 将腐蚀抑制剂添加剂直接加入到用于酸化地下地层的酸性水溶液中。 添加剂基本上由选自锑和锑混合物的金属，季铵化合物和表面活性剂组成。 腐蚀抑制剂不含有毒的炔属化合物。
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公开(公告)号：US5130034A
公开(公告)日：1992-07-14
申请号：US674612
申请日：1991-03-25
CPC分类号： C09K8/54 , C23F11/04 , Y10S507/939
摘要： A corrosion inhibitor for an acid well treating composition includes first metal ions including Sb, Cu, and Bi complexed with a quaternary ammonium compound and second metal ions complexed with a quaternary ammonium compound. The complexed compounds may be prepared and introduced into the acid or the first metal ions may be introduced directly into the acid system.
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公开(公告)号：US5543388A
公开(公告)日：1996-08-06
申请号：US103064
申请日：1993-08-05
CPC分类号： C23F11/04 , C09K8/54 , C09K8/74 , Y10S507/933 , Y10S507/934 , Y10S507/939
摘要： Elemental iodine is used to improve the performance of conventional corrosional inhibitors in oil field acidizing operations. The iodine, because of its solubility, may be used in a formulation which includes a corrosion inhibitor and surfactants dissolved in a suitable organic solvent.
摘要翻译： 元素碘用于改善油田酸化操作中常规腐蚀抑制剂的性能。 由于其溶解度，碘可用于包含腐蚀抑制剂和溶于合适有机溶剂中的表面活性剂的制剂中。
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公开(公告)号：US5200096A
公开(公告)日：1993-04-06
申请号：US768060
申请日：1991-09-27
CPC分类号： C23F11/04 , C09K8/54 , C09K8/74 , Y10S166/902 , Y10S507/934
摘要： Corrosion inhibitor additives are added directly to an aqueous acid solution used in acidizing subterranean formations. The additives comprise a bismuth compound, a quaternary compound, and a surfactant. The corrosion inhibitor is free of toxic Sb and acetylenic compounds.
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公开(公告)号：US5002673A
公开(公告)日：1991-03-26
申请号：US332629
申请日：1989-03-31
CPC分类号： C09K8/54 , C23F11/04 , Y10S507/939
摘要： A corrosion inhibitor formulation for use in well treatig acids includes a highly polar aprotic solvent having dissolved therein (a) a complex of a metal compound and a quaternary ammonium compound and (b) a dispersant capable of dispersing the complex in the well treating acid solution.
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公开(公告)号：US5470823A
公开(公告)日：1995-11-28
申请号：US56674
申请日：1993-05-03
CPC分类号： E21B43/006 , C09K8/584 , C09K8/60
摘要： A coalbed formation is stimulated to improve the recovery of methane which involves injecting into the coalbed formation an aqueous acid solution containing an organic amphoteric tertiary ammonium compound having from 1 to 3 tertiary ammonium groups, each N of which contains at least one C.sub.3 to C.sub.4 unsaturated carboxylic acid group, and wherein the compound contains a terminal benzyl or C.sub.5 -C.sub.19 alkyl group.
摘要翻译： 刺激煤层形成以改善甲烷的回收，其涉及向煤层地层注入含有1-3个叔铵基团的有机两性叔铵化合物的含水酸溶液，每个N含有至少一个C3至C4不饱和的 羧酸基，并且其中所述化合物含有末端苄基或C 5 -C 19烷基。
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公开(公告)号：US5723550A
公开(公告)日：1998-03-03
申请号：US449234
申请日：1995-05-24
IPC分类号： C08F8/36
CPC分类号： C08F8/36 , C08F2800/10
摘要： EPDM elastomer is sulfonated and neutralized by a bulk process involving mechanical mixing at low temperatures in the sulfonating and neutralizing steps. The EPDM is discharged from the mixing process as finely divided particles having a low bulk density.
摘要翻译： EPDM弹性体被磺化并通过包括在磺化和中和步骤中的低温下机械混合的本体方法中和。 EPDM作为具有低体积密度的细碎颗粒从混合过程中排出。
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公开(公告)号：US4731339A
公开(公告)日：1988-03-15
申请号：US899574
申请日：1986-08-25
IPC分类号： H01L21/338 , B44C1/22
CPC分类号： H01L29/66871
摘要： A single-level photoresist process is used to make metal-semiconductor field-effect transistors (MESFETs) having more uniform threshold voltages. An N.sup.- layer is formed in a semi-insulating semiconductor, followed by formation of a dummy gate using a single-level photoresist process. Using the dummy gate as a mask, ions are implanted to form an N.sup.+ region. The length of the dummy gate is then reduced by plasma etching. A dielectric is deposited over the N.sup.+ region, the N.sup.+ /N.sup.- interface, and the exposed portion of the N.sup.- layer. The dummy gate is lifted off to define a self-aligned, submicron gate opening. The gate opening on the N.sup.- layer is reactive ion etched to obtain the desired threshold voltage, and covered with a Schottky gate metal deposit.
摘要翻译： 使用单级光刻胶工艺来制造具有更均匀阈值电压的金属半导体场效应晶体管（MESFET）。 在半绝缘半导体中形成N-层，然后使用单层光致抗蚀剂工艺形成虚拟栅极。 使用伪栅极作为掩模，注入离子以形成N +区域。 然后通过等离子体蚀刻减少虚拟栅极的长度。 电介质沉积在N +区域上，N + / N-界面和N层的暴露部分。 虚拟门被提起以限定自对准的亚微米门开口。 N-层上的栅极开口被反应离子蚀刻以获得所需的阈值电压，并用肖特基栅极金属沉积物覆盖。
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