摘要:
Provided are a solar cell and a method for manufacturing the same, and more particularly, a solar cell for forming a selective emitter structure and a surface texture using dry plasma etching at the same time, and a method for manufacturing the same. The solar cell includes a silicon semiconductor substrate; an emitter doping layer having a surface, which is textured by a texturing process on an upper portion of the silicon semiconductor substrate and selectively doped; an anti-reflective film layer formed on a front of the substrate; a front electrode accessing to the emitter doping layer by penetrating the anti-reflective film layer; and a rear electrode accessing to a rear of the silicon semiconductor substrate.
摘要:
Provided is a method of manufacturing a solar cell, wherein a solar cell is manufactured by combining a damage removal etching process, a texturing process and an edge isolation process. The method is advantageous in that RIE and DRE are conducted, and then DRE/PSG and/or an edge isolation removal process are simultaneously conducted, so that the movement of a substrate (that is, a wafer) is minimized, thereby reducing the damage rate of the substrate.
摘要:
Provided is a method of manufacturing a solar cell, wherein a solar cell is manufactured by combining a damage removal etching process, a texturing process and an edge isolation process. The method is advantageous in that RIE and DRE are conducted, and then DRE/PSG and/or an edge isolation removal process are simultaneously conducted, so that the movement of a substrate (that is, a wafer) is minimized, thereby reducing the damage rate of the substrate.
摘要:
Provided is a solar cell, including: a semiconductor substrate having a p-n junction; an antireflection film formed on at least one side of the semiconductor substrate; first electrodes formed on the antireflection film; and second electrodes covering the first electrodes, wherein only the first electrodes selectively penetrate the antireflection film and is thus connected with the semiconductor substrate by a punch through process.
摘要:
Disclosed herein are acryl microbeads having a narrow particle size distribution and a method of preparing the same. In a method of preparing acryl microbeads through polymerization by stirring a polymerization composition containing vinyl acrylate monomers, an initiator and a dispersion stabilizer at a high speed to form microdroplets and increasing a reaction temperature to induce the polymerization reaction of the monomers within the microdroplets, a low molecular weight seed particle capable of absorbing vinyl acrylate monomers dissolved in a reaction medium outside the microdroplets is supplied at the time of the polymerization reaction, and thus the acryl microbeads have a narrow particle size distribution. The microbeads, which are almost completely free of fine and coarse particles and thus need no sorting process, which range in size from 1 to 50 μm, and which have a narrow particle size distribution can be prepared at a high yield without using a polymerization inhibitor. Exhibiting excellent physicochemical properties including color, transparency, etc., the microbeads can find a wide spectrum of applications in various industries including optical, cosmetic, and food industries.