Thienothiazine derivatives and their use
    4.
    发明授权
    Thienothiazine derivatives and their use 失效
    噻吩嗪衍生物及其用途

    公开(公告)号:US5527796A

    公开(公告)日:1996-06-18

    申请号:US198781

    申请日:1994-02-18

    IPC分类号: C07D513/04 A61K31/38

    CPC分类号: C07D513/04

    摘要: Thienothiazine derivatives of the formula ##STR1## in which X denotes a single bond, a straight chain or branched carbon chain having 1-12 C-atoms in the chain, it being possible for this chain to contain one or more double or triple bonds and/or two or more heteroatoms, Y denotes a single bond, and R denotes a monocyclic or polycyclic, optionally partly hydrogenated aryl, heteroaryl, arlyoxy, arylaza, heteroarylaza, arylthio or heteroarylthio radical which can optionally be substituted by lower alkyl, mono- or poyhalogenated lower alkyl, perfluorinated lower alkyl, alkoxy or halogen, and their use.

    摘要翻译: 其中X表示单键,在链中具有1-12个C原子的直链或支链碳链的式I的噻吩并噻嗪衍生物,该链可能含有一个或多个双键或三键 和/或两个或多个杂原子,Y表示单键,R表示单环或多环,任选部分氢化的芳基,杂芳基,芳芳基,芳基,杂芳基,芳硫基或杂芳硫基,其可任选被低级烷基, 或卤代低级烷基,全氟化低级烷基,烷氧基或卤素,及其用途。

    Thienopyran derivatives, their use for treating hypertension and asthma
    5.
    发明授权
    Thienopyran derivatives, their use for treating hypertension and asthma 失效
    噻吩衍生物,其用于治疗高血压和哮喘的用途

    公开(公告)号:US5077307A

    公开(公告)日:1991-12-31

    申请号:US537629

    申请日:1990-06-13

    CPC分类号: C07D495/04

    摘要: Thienopyran derivatives of the general formula ##STR1## in which the radial ##STR2## denotes one of the formulae ##STR3## R denotes hydrogen or a radical --CN, --CHO, --CH.dbd.NOH, --CONH.sub.2 or --COOR.sub.1,R.sub.1 denotes the radical (C.sub.1 -C.sub.4)-alkyl and n denotes an integer 3, 4 or 5, and a process for their preparation, pharmaceutical preparation and their use for the treatment of diseases which can be cured by activation of membrane K.sup.+ channels, such as high blood pressure and asthma.

    摘要翻译: 其中径向表示其中一个公式的图像的图1的噻吩并吡喃衍生物表示氢或基团-CN,-CHO,-CH = NOH,-CONH 2或-COOR 1,R 1表示 基团(C 1 -C 4) - 烷基,n表示整数3,4或5,以及其制备方法,药物制备及其用于治疗可通过活化膜K +通道而固化的疾病,例如 高血压和哮喘。

    Thermally split zirconium silicate, method of its production and use
    6.
    发明授权
    Thermally split zirconium silicate, method of its production and use 失效
    热分解硅酸锆,其生产和使用方法

    公开(公告)号:US5614011A

    公开(公告)日:1997-03-25

    申请号:US481699

    申请日:1995-06-07

    IPC分类号: C01G25/02 F27D3/14 C01B13/18

    摘要: Thermally split zirconium silicate is produced such that the crystalline zirconium dioxide embedded in an amorphous silica phase exhibits an average grain or particle size (d.sub.50 value) in a range of 0.5 .mu.m to 3.0 .mu.m and a specific surface (BET) in a range of 3 to 15 m.sup.2 /g. The zirconium dioxide produced by this method is particularly suited for the production of zirconium silicate pigments with improved color characteristics. The thermally split zirconium silicate is also particularly well suited for processes used in the obtention of zirconium dioxide. The method of producing the thermally split zirconium silicate includes melting zirconium silicate in an induction melting furnace and cooling off a free falling stream of melt by blowing on it with a gas and/or spraying it with water.

    摘要翻译: 制备热分解硅酸锆,使得嵌入无定形二氧化硅相中的结晶二氧化锆在0.5μm至3.0μm的范围内表现出平均晶粒或粒径(d50值),在一定范围内的比表面积(BET) 为3至15m2 / g。 通过该方法制备的二氧化锆特别适合于生产具有改进的颜色特性的硅酸锆颜料。 热裂硅酸锆也特别适用于获得二氧化锆的工艺。 制造热裂硅酸锆的方法包括在感应熔化炉中熔化硅酸锆,并用气体吹送和/或用水喷雾来冷却游离的熔体流。

    Method and apparatus for the semi-continuous melting and discharging of
ceramic material in an induction melting furnace with sintering crust
crucible
    7.
    发明授权
    Method and apparatus for the semi-continuous melting and discharging of ceramic material in an induction melting furnace with sintering crust crucible 失效
    在具有烧结地壳坩埚的感应熔炼炉中半连续熔融和排出陶瓷材料的方法和装置

    公开(公告)号:US5526375A

    公开(公告)日:1996-06-11

    申请号:US393425

    申请日:1995-02-23

    摘要: A method is disclosed for the semi-continuous melting of ceramic material by means of inductive melting in high-frequency and medium-frequency induction melting furnaces whose melting coil surrounds a sintering crust crucible and contains a run-out channel. In the method, melt is periodically run out and material to be melted is supplied to the crucible so as to replace the material removed preferably so as to maintain a constant level. An intensively cooled channel is used as a run-out device. For the melt broaching, the melt nose is grasped from below by way of an automatically controllable broaching lance of a broaching device and raised. The broaching lance is then advanced between the bottom of the channel and the solidified melt until the sintering crust is pierced. The method permits a reliable and economic management of the process and the maintenance of the quality of the melted products. A device for periodic melt broaching as well as an induction melting furnace equipped with an intensively coolable run-out channel provides apparatus for carrying out the above method.

    摘要翻译: 公开了一种通过在高频和中频感应熔炼炉中进行感应熔化的陶瓷材料半连续熔化的方法,其中熔化线圈围绕着烧结的地壳坩埚并且包含一个流出通道。 在该方法中,熔体周期性地流出,并将待熔化的材料供应到坩埚中,以便更换移除的材料,以便保持恒定的水平。 密集冷却通道用作漏气装置。 对于熔体拉削,通过拉削装置的可自动控制的拉削喷枪将熔体鼻从下方抓取并升起。 然后在通道的底部和固化的熔体之间推进拉刀枪,直到烧结外壳被刺穿。 该方法允许可靠和经济地管理过程和维持熔化产品的质量。 用于周期性熔融拉削的装置以及装备有可冷却可靠的漏气通道的感应熔炼炉提供用于执行上述方法的装置。

    Thiazine derivatives
    9.
    发明授权
    Thiazine derivatives 失效
    噻嗪衍生物

    公开(公告)号:US4180662A

    公开(公告)日:1979-12-25

    申请号:US938274

    申请日:1978-08-31

    摘要: Anti-inflammatory, analgesic, anti-rheumatic and anti-thrombotic thienothiazine derivatives having the formula ##STR1## wherein A together with the two carbon atoms forms the group ##STR2## and the dotted line indicates the double bond present in the first and last thieno structures above, R.sup.1 is lower alkyl, R.sup.2 is the radical of an aromatic heterocycle with 1 to 4 hetero atoms optionally substituted by one or two lower alkyl groups, or a phenyl radical optionally substituted by halogen, hydroxy, lower alkyl, trifluoromethyl or lower alkoxy, R.sup.3 is halogen and R.sup.3' is hydrogen or halogen,and pharmaceutically acceptable salts thereof are described.

    摘要翻译: 具有下式的抗炎,止痛,抗风湿和抗血栓形成噻吩噻嗪衍生物其中A与两个碳原子一起形成基团,虚线表示存在于第一和最后一个 R 1为低级烷基,R 2为任选被一个或两个低级烷基取代的具有1至4个杂原子的芳族杂环的基团,或任选被卤素,羟基,低级烷基,三氟甲基或低级烷基取代的苯基 烷氧基,R 3为卤素,R 3'为氢或卤素,及其药学上可接受的盐。