Passive infrared intrusion detector and its use
    1.
    发明授权
    Passive infrared intrusion detector and its use 失效
    被动红外入侵探测器及其用途

    公开(公告)号:US5942976A

    公开(公告)日:1999-08-24

    申请号:US742813

    申请日:1996-11-01

    IPC分类号: G08B29/04 G08B13/00

    CPC分类号: G08B29/046 Y10S250/01

    摘要: A passive infrared intrusion detector for the detection of infrared body radiation includes a sabotage detector, in particular for detecting spraying of the entrance window of the intrusion detector. The sabotage detector includes a light source, a corresponding light sensor, and an optical diffraction grating structure on the outside of the entrance window. The light source and the light sensor can be on the same or on opposite sides of the entrance window. By first- or higher-order diffraction, light from the light source is focused onto the sensor, and a resulting electrical signal from the sensor is evaluated by an evaluation circuit. In case of sabotage, the focusing effect of the optical diffraction grating structure vanishes, so that the light intensity at the detector is reduced. The drop in light intensity triggers a sabotage alarm signal.

    摘要翻译: 用于检测红外线体辐射的被动红外入侵检测器包括破坏检测器,特别是用于检测入侵检测器的入口窗口的喷雾。 破坏检测器包括光源,相应的光传感器和入射窗外侧的光学衍射光栅结构。 光源和光传感器可以在入口窗口的相同或相对两侧。 通过一阶或高阶衍射,来自光源的光聚焦到传感器上,并且通过评估电路评估来自传感器的所得电信号。 在破坏的情况下,光学衍射光栅结构的聚焦效应消失,从而降低了检测器处的​​光强度。 光强度的下降触发了破坏报警信号。

    Black-and-white diffractive subtractive light filter
    2.
    发明授权
    Black-and-white diffractive subtractive light filter 失效
    黑白衍射减色光滤光片

    公开(公告)号:US4062628A

    公开(公告)日:1977-12-13

    申请号:US671105

    申请日:1976-03-29

    CPC分类号: G02B27/4205 G02B5/1842

    摘要: The disclosed filter provides (1) a high contrast between black and white together with a substantially neutral black and/or (2) a gray-scale color (wavelength) characteristic which is substantially independent of luminosity, and is preferably neutral. Neutral black is achieved when two superimposed, crossed, sine-wave gratings embossed in plastic have different depths which are selected to provide a zero-diffraction-order-light transmittance wavelength selectivity characteristic for any one of the phase gratings which exhibits a minimum zero-diffraction-order-light transmittance at desired different wavelengths in the visible spectrum. A gray scale is achieved by mixing black-manifesting subareas with white-manifesting subareas.

    摘要翻译: 所公开的滤光器提供(1)黑色和白色之间的高对比度以及基本上中性黑色和/或(2)基本上独立于发光度的灰度级颜色(波长)特性,并且优选是中性的。 当在塑料中压印的两个叠加的,交叉的正弦波光栅具有不同的深度时,实现中性黑色,其被选择为为任何一个相位光栅提供零衍射级光透射率波长选择性特性, 在可见光谱中所需不同波长的衍射级光透射率。 通过将黑色表现的子区域与白色表现的子区域混合来实现灰度级。

    Method for producing width-modulated surface relief patterns
    3.
    发明授权
    Method for producing width-modulated surface relief patterns 失效
    产生宽度调制表面浮雕图案的方法

    公开(公告)号:US3945825A

    公开(公告)日:1976-03-23

    申请号:US472436

    申请日:1974-05-22

    摘要: Pulse width modulated surface relief phase holograms are produced on a substrate by developing a holographic interference pattern recorded on a photoresist deposited on the surface of said substrate as an amplitude modulated sinusoidal surface relief pattern so as to expose the surface of said substrate as a function of the intensity of said interference pattern, uniformly etching said substrate and removing said photoresist leaving a pulse width modulated, substantially two-level rectangular wave diffraction grating. Focused image holograms produced by this method on hard durable substrates may be used as masters for replicating said holograms in a suitable recording medium.

    摘要翻译: 脉冲宽度调制的表面起伏相位全息图是通过将记录在所述基片表面上的光刻胶上记录的全息干涉图案作为幅度调制的正弦曲面浮雕图案而形成在基板上,以便将基板的表面作为 所述干涉图案的强度,均匀蚀刻所述衬底并除去所述光致抗蚀剂,留下脉冲宽度调制的基本上两级的矩形波衍射光栅。 通过该方法在耐用耐用的基材上产生的聚焦图像全息图可以用作在合适的记录介质中复制所述全息图的主体。

    Fabrication of diffractive subtractive filter embossing master
    4.
    发明授权
    Fabrication of diffractive subtractive filter embossing master 失效
    制造衍射减法过滤器压花母版

    公开(公告)号:US4108660A

    公开(公告)日:1978-08-22

    申请号:US781304

    申请日:1977-03-25

    CPC分类号: G03F7/001

    摘要: A recording blank, composed of at least one diffraction grating substrate, such as nickel, covered with a layer of photoresist is used to produce an embossing master by exposing the photoresist to picture information composed of respective white and non-white manifesting regions; developing the exposed photoresist to reveal the grating portions underlying solely the white manifesting regions; electroplating and/or etching the revealed portions to level and obliterate the revealed grating portions, and then removing the remainder of the photoresist.

    摘要翻译: 使用覆盖有光致抗蚀剂层的至少一个衍射光栅基底(例如镍)构成的记录毛坯通过将光致抗蚀剂暴露于由相应的白色和非白色表现区域组成的图像信息来产生压纹母版; 显影曝光的光致抗蚀剂以露出仅在白色表现区域的光栅部分; 电镀和/或蚀刻所揭示的部分以对所揭示的光栅部分进行平整和消除,然后去除光致抗蚀剂的其余部分。

    Generation of permanent phase holograms and relief patterns in durable
media by chemical etching
    5.
    发明授权
    Generation of permanent phase holograms and relief patterns in durable media by chemical etching 失效
    通过化学蚀刻在耐用介质中产生永久相位全息图和浮雕图案

    公开(公告)号:US3944420A

    公开(公告)日:1976-03-16

    申请号:US472350

    申请日:1974-05-22

    CPC分类号: G03F7/001 Y10S359/90

    摘要: A surface relief pattern, e.g. a surface relief hologram, is substantially linearly transferred to a hard durable substrate, capable of being used as a medium for permanent storage of the pattern or as a master for replicating the hologram, from a photoresist coated on the substrate, by exposing the photoresist and the substrate to a photoresist developer bath and a chemical bath capable of etching the substrate at a rate substantially proportional to the development rate of the photoresist. This technique allows the transfer of surface relief patterns with dimensions on the order of one micron or less, and is applicable to the formation of surface relief holographic patterns in permanent media for archival storage and to making master surface relief holograms.

    摘要翻译: 表面浮雕图案,例如 表面浮雕全息图基本上线性地转移到坚硬耐用的基板上,能够作为用于永久性地存储图案的介质或作为用于复制全息图的原稿从涂覆在基板上的光刻胶,通过曝光光致抗蚀剂和 基板到光致抗蚀剂显影剂浴和能够以与光致抗蚀剂的显影速率基本成比例的速率蚀刻基板的化学浴。 这种技术允许将尺寸为1微米或更小的表面浮雕图案转移,并且适用于在用于档案存储的永久介质中形成表面浮雕全息图案,并且可用于制作主表面浮雕全息图。