Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
    1.
    发明授权
    Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate 有权
    薄膜晶体管基板及其制造方法以及用于制造薄膜晶体管基板的掩模

    公开(公告)号:US07960221B2

    公开(公告)日:2011-06-14

    申请号:US12755920

    申请日:2010-04-07

    IPC分类号: H01L21/00 H01L21/84

    摘要: A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.

    摘要翻译: 一种薄膜晶体管基板,其中薄膜晶体管(TFT)的源极和漏极之间的电子的移动面积最小化,电子的移动距离增加,并且由栅电极限定的电容器的尺寸与相应的 源极和漏极彼此相同,使得当TFT截止时产生的截止电流可以最小化; 制造薄膜晶体管基板的方法; 以及用于制造薄膜晶体管基板的掩模。 因此,可以将由于光的电子俘获现象引起的截止电流最小化。

    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME AND MASK FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
    2.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME AND MASK FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE 有权
    薄膜晶体管基板及其制造方法和制造薄膜晶体管基板的掩模

    公开(公告)号:US20100197086A1

    公开(公告)日:2010-08-05

    申请号:US12755920

    申请日:2010-04-07

    IPC分类号: H01L21/336

    摘要: A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.

    摘要翻译: 一种薄膜晶体管基板,其中薄膜晶体管(TFT)的源极和漏极之间的电子的移动面积最小化,电子的移动距离增加,并且由栅电极限定的电容器的尺寸与相应的 源极和漏极彼此相同,使得当TFT截止时产生的截止电流可以最小化; 制造薄膜晶体管基板的方法; 以及用于制造薄膜晶体管基板的掩模。 因此,可以将由于光的电子俘获现象引起的截止电流最小化。

    Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
    3.
    发明申请
    Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate 有权
    薄膜晶体管基板及其制造方法以及用于制造薄膜晶体管基板的掩模

    公开(公告)号:US20070181877A1

    公开(公告)日:2007-08-09

    申请号:US11496320

    申请日:2006-07-31

    IPC分类号: H01L29/04

    摘要: A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.

    摘要翻译: 一种薄膜晶体管基板,其中薄膜晶体管(TFT)的源极和漏极之间的电子的移动面积最小化,电子的移动距离增加,并且由栅电极限定的电容器的尺寸与相应的 源极和漏极彼此相同,使得当TFT截止时产生的截止电流可以最小化; 制造薄膜晶体管基板的方法; 以及用于制造薄膜晶体管基板的掩模。 因此,可以将由于光的电子俘获现象引起的截止电流最小化。

    Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
    4.
    发明授权
    Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate 有权
    薄膜晶体管基板及其制造方法以及用于制造薄膜晶体管基板的掩模

    公开(公告)号:US07719008B2

    公开(公告)日:2010-05-18

    申请号:US11496320

    申请日:2006-07-31

    IPC分类号: H01L31/20

    摘要: A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.

    摘要翻译: 一种薄膜晶体管基板,其中薄膜晶体管(TFT)的源极和漏极之间的电子的移动面积最小化,电子的移动距离增加,并且由栅电极限定的电容器的尺寸与相应的 源极和漏极彼此相同,使得当TFT截止时产生的截止电流可以最小化; 制造薄膜晶体管基板的方法; 以及用于制造薄膜晶体管基板的掩模。 因此,可以将由于光的电子俘获现象引起的截止电流最小化。