利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.03 秒)

    CO-CULTURE DEVICE ASSEMBLY
    1.
    发明申请
    CO-CULTURE DEVICE ASSEMBLY 有权
    文化设备组合

    公开(公告)号：US20130143254A1

    公开(公告)日：2013-06-06

    申请号：US13309209

    申请日：2011-12-01

    申请人： Donald Thomas ,  Wei Li ,  Ning Ke ,  Nan Li ,  Adrian Papas ,  Manfred Watzele ,  Alexander Seiler ,  Tianxing Wang ,  Yama Abassi ,  Xiaobo Wang

    发明人： Donald Thomas ,  Wei Li ,  Ning Ke ,  Nan Li ,  Adrian Papas ,  Manfred Watzele ,  Alexander Seiler ,  Tianxing Wang ,  Yama Abassi ,  Xiaobo Wang

    IPC分类号： G01N27/02 ,  G01N21/00 ,  C12M1/34 ,  C12Q1/02 ,  C12M1/12 ,  C12M1/00

    CPC分类号： C12M25/04 ,  C12Q1/02 ,  G01N21/253 ,  G01N21/6452 ,  G01N33/48735 ,  G01N33/54373

    摘要： An insert device and co-culture device assembly incorporating the insert device, which includes an insert chamber with two fluid impermeable side walls that extend from a microporous bottom to an open top to form an inner cavity. The first side wall is shaped to form a convex arc that follows between about half of a circumference of the well and less than an entire circumference of the well. The second side wall joins ends of the first side wall and protrudes inward towards a center of the convex arc. A flange extends outward from or beneath the top and is notched to form a gap adjacent to the second side wall, which forms an access port allowing access to the lower chamber with a micropipette tip when the insert device is inserted into a well of a single or multi-well plate.

    摘要翻译： 包括插入装置的插入装置和共培养装置组件，其包括具有从微孔底部延伸到开口顶部以形成内腔的两个流体不可渗透侧壁的插入室。 第一侧壁成形为形成沿着井的圆周的大约一半且小于井的整个圆周的凸弧。 第二侧壁连接第一侧壁的端部并朝向凸弧的中心向内突出。 凸缘从顶部向下或从顶部向外延伸并且被切口以形成与第二侧壁相邻的间隙，当形成插入装置插入到单个孔中时，形成允许通过微量移液管尖端进入下腔室的进入口 或多孔板。