公开(公告)号：US07672079B2

公开(公告)日：2010-03-02

申请号：US10886284

申请日：2004-07-07

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.

摘要翻译： 主极层沉积在衬底上的图案化光致抗蚀剂层的开口内。 光致抗蚀剂变薄以暴露极尖区域的上部，然后将其修剪成矩形，而下部保持倒梯形形状。 此后，第二修整处理在上部矩形部分中形成具有第一宽度的极尖，并且在下部形成小于第一宽度的第二厚度和第二宽度。 CMP步骤随后将上部部分变薄至0.04至0.08微米的第一厚度，而第二厚度保持在0.16至0.32微米。 沿着ABS的下部的底面在记录操作中成为后缘。 极尖具有不受CMP工艺变化影响的一致的第一宽度（轨道宽度）。

公开(公告)号：US07394621B2

公开(公告)日：2008-07-01

申请号：US10881444

申请日：2004-06-30

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49021

摘要： A method for independently forming neck height (NH) and pole width dimensions in a main pole layer of a PMR write head is described. A main pole layer with a pole tip region is formed on a bottom yoke. The pole tip region is trimmed by an ion milling process to give a pole width. A bilayer resist is patterned to form an opening with an undercut on the main pole layer. The opening uncovers the pole tip region except for an NH length adjacent to the pole tip. A top yoke comprised of CoFeN with a thickness of about 0.2 microns is deposited in the opening and the bilayer resist is removed by a lift-off process. Thereafter, a write gap layer is formed on the pole tip region and then first, second, and third write shield layers are formed above the write gap layer along the ABS.

摘要翻译： 描述了在PMR写头的主极层中独立地形成颈部高度（NH）和极宽度尺寸的方法。 具有极尖区域的主极层形成在底架上。 通过离子铣削工艺修剪极尖区域以产生极宽度。 图案化双层抗蚀剂以在主极层上形成具有底切的开口。 除了与极尖相邻的NH长度之外，开口露出磁极尖端区域。 由厚度约0.2微米的CoFeN组成的顶部磁轭沉积在开口中，并通过剥离过程去除双层抗蚀剂。 此后，在极尖区域上形成写间隙层，然后沿着ABS形成在写间隙层上方的第一，第二和第三写屏蔽层。

公开(公告)号：US20080096114A1

公开(公告)日：2008-04-24

申请号：US12002160

申请日：2007-12-14

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G03F1/08

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  H01F41/34 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49124 ,  Y10T29/49147

摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.

摘要翻译： 描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。 传统氧化铝在模具的磁轭部分被钽代替。 当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度 。

公开(公告)号：US20060276039A1

公开(公告)日：2006-12-07

申请号：US11146583

申请日：2005-06-07

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： H01L21/302

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  H01F41/34 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49124 ,  Y10T29/49147

摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.

摘要翻译： 描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。 传统氧化铝在模具的磁轭部分被钽代替。 当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度 。

公开(公告)号：US07313863B2

公开(公告)日：2008-01-01

申请号：US11146583

申请日：2005-06-07

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： H01R9/00 ,  H05K3/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  H01F41/34 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49124 ,  Y10T29/49147

摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.

摘要翻译： 描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。 传统氧化铝在模具的磁轭部分被钽代替。 当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度 。

公开(公告)号：US20060002021A1

公开(公告)日：2006-01-05

申请号：US10881444

申请日：2004-06-30

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/147

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49021

摘要： A method for independently forming neck height (NH) and pole width dimensions in a main pole layer of a PMR write head is described. A main pole layer with a pole tip region is formed on a bottom yoke. The pole tip region is trimmed by an ion milling process to give a pole width. A bilayer resist is patterned to form an opening with an undercut on the main pole layer. The opening uncovers the pole tip region except for an NH length adjacent to the pole tip. A top yoke comprised of CoFeN with a thickness of about 0.2 microns is deposited in the opening and the bilayer resist is removed by a lift-off process. Thereafter, a write gap layer is formed on the pole tip region and then first, second, and third write shield layers are formed above the write gap layer along the ABS.

摘要翻译： 描述了在PMR写头的主极层中独立地形成颈部高度（NH）和极宽度尺寸的方法。 具有极尖区域的主极层形成在底架上。 通过离子铣削工艺修剪极尖区域以产生极宽度。 图案化双层抗蚀剂以在主极层上形成具有底切的开口。 除了与极尖相邻的NH长度之外，开口露出磁极尖端区域。 由厚度约0.2微米的CoFeN组成的顶部磁轭沉积在开口中，并通过剥离过程去除双层抗蚀剂。 此后，在极尖区域上形成写间隙层，然后沿着ABS形成在写间隙层上方的第一，第二和第三写屏蔽层。

公开(公告)号：US07975366B2

公开(公告)日：2011-07-12

申请号：US12002160

申请日：2007-12-14

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： H04R31/00 ,  C23F1/02

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  H01F41/34 ,  Y10T29/49032 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49124 ,  Y10T29/49147

摘要： A process to reduce the bevel angle in a mold used to form a write head is disclosed. First, tantalum is used instead of alumina for the yoke area. Then both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, leading to sloping sidewalls in the alumina area (write pole) while providing near vertical sidewalls in the tantalum (yoke) area. Consequently, the neck height is the same at the cavity floor as it is at the cavity top.

摘要翻译： 公开了一种减少用于形成写头的模具中的斜角的方法。 首先，使用钽代替氧化铝作为磁轭区域。 然后钽和氧化铝区域同时经受反应离子蚀刻，导致氧化铝区域（写极）中的倾斜侧壁，同时在钽（轭）区域中提供近似垂直的侧壁。 因此，颈部的高度在空腔底部是相同的，因为它在腔顶部。

公开(公告)号：US07950138B2

公开(公告)日：2011-05-31

申请号：US12658536

申请日：2010-02-08

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.

摘要翻译： 主极层沉积在衬底上的图案化光致抗蚀剂层的开口内。 光致抗蚀剂变薄以暴露极尖区域的上部，然后将其修剪成矩形，而下部保持倒梯形形状。 此后，第二修整处理在上部矩形部分中形成具有第一宽度的极尖，并且在下部形成小于第一宽度的第二厚度和第二宽度。 CMP步骤随后将上部部分变薄至0.04至0.08微米的第一厚度，而第二厚度保持在0.16至0.32微米。 沿着ABS的下部的底面在记录操作中成为后缘。 极尖具有不受CMP工艺变化影响的一致的第一宽度（轨道宽度）。

公开(公告)号：US20100146773A1

公开(公告)日：2010-06-17

申请号：US12658536

申请日：2010-02-08

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.

公开(公告)号：US20060044677A1

公开(公告)日：2006-03-02

申请号：US10886284

申请日：2004-07-07

申请人： Donghong Li ,  Yoshitaka Sasaki

发明人： Donghong Li ,  Yoshitaka Sasaki

IPC分类号： G11B5/187 ,  G11B5/127 ,  G11B5/147

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.

摘要翻译： 主极层沉积在衬底上的图案化光致抗蚀剂层的开口内。 光致抗蚀剂变薄以暴露极尖区域的上部，然后将其修剪成矩形，而下部保持倒梯形形状。 此后，第二修整处理在上部矩形部分中形成具有第一宽度的极尖，并且在下部形成小于第一宽度的第二厚度和第二宽度。 CMP步骤随后将上部部分变薄至0.04至0.08微米的第一厚度，而第二厚度保持在0.16至0.32微米。 沿着ABS的下部的底面在记录操作中成为后缘。 极尖具有不受CMP工艺变化影响的一致的第一宽度（轨道宽度）。