Embossing process including discrete and linear embossing elements
    2.
    发明授权
    Embossing process including discrete and linear embossing elements 有权
    压花工艺包括离散和线性压花元件

    公开(公告)号:US07524404B2

    公开(公告)日:2009-04-28

    申请号:US11147873

    申请日:2005-06-08

    IPC分类号: D21H27/02 D21H27/40 B31F1/07

    摘要: An apparatus for producing an embossed product including a first embossing member having a plurality of discrete embossing elements disposed in a first non-random pattern having at least one first single pattern unit. The total area of the distal ends of the discrete embossing elements in the first single pattern unit is less than about 5.0 cm2. The apparatus also includes a second embossing member having a plurality of linear embossing elements disposed in a second non-random pattern having at least one second single pattern unit. The total area of the second distal ends in the second single pattern unit is less than about 10 cm2. The second non-random pattern is coordinated with the first non-random pattern such that when engaged with each other the first single pattern unit and the second single pattern unit make up an embossing pattern single pattern unit.

    摘要翻译: 一种用于生产压花产品的装置,包括具有以具有至少一个第一单一图案单元的第一非随机图案布置的多个离散压花元件的第一压花部件。 第一单一图案单元中离散压花元件的远端的总面积小于约5.0cm 2。 该装置还包括第二压花构件,其具有以具有至少一个第二单一图案单元的第二非随机图案设置的多个线性压花元件。 第二单一图案单元中的第二远端的总面积小于约10cm 2。 第二非随机图案与第一非随机图案协调,使得当彼此接合时,第一单个图案单元和第二单个图案单元组成压花图案单一图案单元。

    HIGH PRESSURE EMBOSSING APPARATUS
    4.
    发明申请
    HIGH PRESSURE EMBOSSING APPARATUS 审中-公开
    高压铆接设备

    公开(公告)号:US20100297286A1

    公开(公告)日:2010-11-25

    申请号:US12469715

    申请日:2009-05-21

    IPC分类号: B28B3/16

    摘要: An apparatus for embossing a web substrate is disclosed. The apparatus has a pattern roll having an embossing pattern disposed thereon, an anvil roll juxtaposed in an axially parallel relationship with the pattern roll, and an embossing roll juxtaposed in an axially parallel relationship with said pattern roll. The anvil roll has a hardness of less than about 40 P&J. The embossing roll has a hardness of greater than about 40 P&J.

    摘要翻译: 公开了一种用于压花卷筒纸基材的装置。 该装置具有设置在其上的压纹图案的图案辊,与图案辊以轴向平行关系并置的砧辊,以及与所述图案辊轴向平行关系的压花辊。 砧辊的硬度小于约40 P&J。 压花辊具有大于约40P&J的硬度。

    EMBOSSING PROCESS INCLUDING DISCRETE AND LINEAR EMBOSSING ELEMENTS
    5.
    发明申请
    EMBOSSING PROCESS INCLUDING DISCRETE AND LINEAR EMBOSSING ELEMENTS 有权
    包括离散和线性破坏元素的破坏过程

    公开(公告)号:US20080302493A1

    公开(公告)日:2008-12-11

    申请号:US12171652

    申请日:2008-07-11

    IPC分类号: D21H27/02

    摘要: A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.

    摘要翻译: 公开了一种用于生产深嵌套压纹产品的方法。 该方法包括以下步骤:a)提供具有配合的第一和第二压花构件的压花装置; b)以非随机图案向第一压花构件提供多个离散压花元件; c)向所述第二压花构件提供至少一个线性压花元件; d)使所述至少一个线性压花元件与所述第一压花元件的非随机图案协调; e)使第一压花构件和第二压花构件对准,使得第一压花元件的非随机图案与至少一个线性压花元件嵌套到大于约0.01mm的接合深度; f)向压花装置提供一层或多层材料; 以及g)使所述材料的所述一层或多层在所述第一和第二压花构件之间通过以产生深嵌套的压花产品。

    Apparatus and process for cleaning process surfaces
    7.
    发明申请
    Apparatus and process for cleaning process surfaces 有权
    用于清洁工艺表面的设备和工艺

    公开(公告)号:US20070221248A1

    公开(公告)日:2007-09-27

    申请号:US11728085

    申请日:2007-03-23

    IPC分类号: B08B1/04

    摘要: A brush, as well as a method for cleaning a process surface using the brush, having: a hollow cylinder having a closed first end, a closed second end, and a peripheral wall with an internal and external surface; with bristles arranged on the external surface of the peripheral wall thereof; wherein the hollow cylinder has a plurality of apertures formed in the peripheral wall for permitting a gas or liquid to emerge from the interior of the hollow cylinders to the vicinity of the bristles; wherein the apertures are arranged in a staggered multi helical pattern having from about 3 to about 15 helix; and wherein the peripheral wall has a surface area ratio of from about 6 to about 30.

    摘要翻译: 刷子以及使用刷子清洁处理表面的方法具有:具有闭合的第一端,封闭的第二端和具有内表面和外表面的周壁的中空圆筒; 其刷毛布置在其周壁的外表面上; 其中所述中空圆柱体具有形成在所述周壁中的多个孔,用于允许气体或液体从所述中空圆柱体的内部露出到所述刷毛附近; 其中所述孔布置成具有约3至约15个螺旋的交错多螺旋图案; 并且其中所述周壁具有约6至约30的表面积比。

    Apparatus for cleaning process surfaces
    8.
    发明授权
    Apparatus for cleaning process surfaces 有权
    清洗工艺表面的设备

    公开(公告)号:US08020237B2

    公开(公告)日:2011-09-20

    申请号:US11728085

    申请日:2007-03-23

    IPC分类号: B08B1/04

    摘要: A brush, as well as a method for cleaning a process surface using the brush, having: a hollow cylinder having a closed first end, a closed second end, and a peripheral wall with an internal and external surface; with bristles arranged on the external surface of the peripheral wall thereof; wherein the hollow cylinder has a plurality of apertures formed in the peripheral wall for permitting a gas or liquid to emerge from the interior of the hollow cylinders to the vicinity of the bristles; wherein the apertures are arranged in a staggered multi helical pattern having from about 3 to about 15 helix; and wherein the peripheral wall has a surface area ratio of from about 6 to about 30.

    摘要翻译: 刷子以及使用刷子清洁处理表面的方法具有:具有闭合的第一端,封闭的第二端和具有内表面和外表面的周壁的中空圆筒; 其刷毛布置在其周壁的外表面上; 其中所述中空圆柱体具有形成在所述周壁中的多个孔,用于允许气体或液体从所述中空圆柱体的内部露出到所述刷毛附近; 其中所述孔布置成具有约3至约15个螺旋的交错多螺旋图案; 并且其中所述周壁具有约6至约30的表面积比。