Apparatus for determining optimum position of focus of an imaging system
    1.
    发明授权
    Apparatus for determining optimum position of focus of an imaging system 有权
    用于确定成像系统的焦点的最佳位置的装置

    公开(公告)号:US07633041B2

    公开(公告)日:2009-12-15

    申请号:US11524684

    申请日:2006-09-21

    IPC分类号: G02B7/04 G01N21/86

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects
    2.
    发明授权
    System for detection of wafer defects 有权
    晶圆缺陷检测系统

    公开(公告)号:US07961763B2

    公开(公告)日:2011-06-14

    申请号:US11476342

    申请日:2006-06-28

    IPC分类号: H01S3/10 H01S3/11 H01S3/0915

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅立叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects

    公开(公告)号:US20060244956A1

    公开(公告)日:2006-11-02

    申请号:US11476322

    申请日:2006-06-28

    IPC分类号: G01N21/88

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    System for detection of wafer defects
    4.
    发明授权
    System for detection of wafer defects 有权
    晶圆缺陷检测系统

    公开(公告)号:US07843559B2

    公开(公告)日:2010-11-30

    申请号:US11476358

    申请日:2006-06-28

    IPC分类号: G01N21/00

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects
    5.
    发明申请
    System for detection of wafer defects 有权
    晶圆缺陷检测系统

    公开(公告)号:US20070013903A1

    公开(公告)日:2007-01-18

    申请号:US11524684

    申请日:2006-09-21

    IPC分类号: G01N21/88

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅立叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects
    6.
    发明申请

    公开(公告)号:US20060244957A1

    公开(公告)日:2006-11-02

    申请号:US11476356

    申请日:2006-06-28

    IPC分类号: G01N21/88

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    System for detection of wafer defects
    7.
    发明申请
    System for detection of wafer defects 有权
    晶圆缺陷检测系统

    公开(公告)号:US20050110987A1

    公开(公告)日:2005-05-26

    申请号:US11021393

    申请日:2004-12-23

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of water defects
    8.
    发明授权
    System for detection of water defects 有权
    水缺陷检测系统

    公开(公告)号:US07525659B2

    公开(公告)日:2009-04-28

    申请号:US10345097

    申请日:2003-01-15

    IPC分类号: G01B11/00

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects
    9.
    发明授权
    System for detection of wafer defects 有权
    晶圆缺陷检测系统

    公开(公告)号:US07477383B2

    公开(公告)日:2009-01-13

    申请号:US11476322

    申请日:2006-06-28

    IPC分类号: G01N21/00

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    摘要翻译: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

    System for detection of wafer defects

    公开(公告)号:US20070019856A1

    公开(公告)日:2007-01-25

    申请号:US11476342

    申请日:2006-06-28

    IPC分类号: G06K9/00

    摘要: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.