公开(公告)号：US09875869B2

公开(公告)日：2018-01-23

申请号：US14512688

申请日：2014-10-13

申请人： EATON CORPORATION

发明人： Louis Grant Campbell ,  Eric Dennis Smith ,  Franklin Willis Freeborn

IPC分类号： H01H33/662 ,  H01H11/00

CPC分类号： H01H33/66207 ,  H01H11/00 ,  H01H33/66261 ,  H01H2033/66223 ,  H01H2033/66269

摘要： The disclosed concept pertains to vacuum interrupters and arc-resistant shields. The arc-resistant shields are positioned in between a ceramic insulator. Each end of the arc-resistant shield is hermetically sealed to the ceramic insulator. The arc-resistant shield includes an outer surface and an inner surface. The inner surface includes an arc-resistant material. Disposed within the arc-resistant shield is a pair of electrode assemblies which are separable to establish arcing. In certain embodiments, the arc-resistant material is copper-chromium alloy.

公开(公告)号：US10679806B2

公开(公告)日：2020-06-09

申请号：US15817950

申请日：2017-11-20

申请人： EATON CORPORATION

发明人： Louis Grant Campbell ,  Eric Dennis Smith ,  Franklin Willis Freeborn

IPC分类号： H01H33/662 ,  H01H11/00

摘要： The disclosed concept pertains to vacuum interrupters and arc-resistant shields. The arc-resistant shields are positioned in between a ceramic insulator. Each end of the arc-resistant shield is hermetically sealed to the ceramic insulator. The arc-resistant shield includes an outer surface and an inner surface. The inner surface includes an arc-resistant material. Disposed within the arc-resistant shield is a pair of electrode assemblies which are separable to establish arcing. In certain embodiments, the arc-resistant material is copper-chromium alloy.

公开(公告)号：US10468205B2

公开(公告)日：2019-11-05

申请号：US15377258

申请日：2016-12-13

申请人： EATON CORPORATION

发明人： Louis Grant Campbell ,  Ganesh Kumar Balasubramanian ,  Benjamin Alex Rosenkrans

IPC分类号： H01H1/02 ,  H01H1/025 ,  H01H1/027 ,  H01B1/02 ,  B22F3/15 ,  B22F3/16 ,  B22F3/10 ,  B22F3/105 ,  B22F3/24 ,  B22F1/00 ,  B22F9/04 ,  C22C9/00 ,  C22C30/02 ,  C22C32/00

摘要： An improved electrical contact alloy, useful for example, in vacuum interrupters used in vacuum contactors is provided. The contact alloy according to the disclosed concept comprises copper particles and chromium particles present in a ratio of copper to chromium of 2:3 to 20:1. The electrical contact alloy also comprises particles of a carbide, which reduces the weld break strength of the electrical contact alloy without reducing its interruption performance.

公开(公告)号：US09368301B2

公开(公告)日：2016-06-14

申请号：US14158928

申请日：2014-01-20

申请人： EATON CORPORATION

发明人： Louis Grant Campbell ,  Stephen David Mayo

IPC分类号： H01H33/662 ,  B22F1/00 ,  B22F3/12 ,  B22F3/24 ,  B22F7/04 ,  C22C9/00 ,  C22C30/00

CPC分类号： H01H33/66261 ,  B22F1/00 ,  B22F3/12 ,  B22F3/24 ,  B22F7/04 ,  B22F2003/247 ,  B22F2007/042 ,  C22C9/00 ,  C22C30/00 ,  H01H2033/66269 ,  H01H2033/66284

摘要： The disclosed concept pertains to alloy compositions, methods and arc-resistant shields composed of the alloy compositions. The arc-resistant shields are positioned in vacuum interrupter chambers and demonstrate resistance to arc damage and ability to hold off high voltages after arcing, while providing a lower cost alternative to traditional alloy compositions used for producing arc-resistant shields. In certain embodiments, the alloy compositions include copper and/or an element chemically compatible to copper and another component, such as but not limited to, iron, stainless steel, niobium, molybdenum, vanadium, tungsten carbide, chromium carbide, vanadium carbide and chromium, and alloys and mixtures thereof.

摘要翻译： 所公开的概念涉及由合金组成组成的合金组成，方法和抗电弧屏蔽。 防弧屏蔽被定位在真空断路器室中，表现出对电弧损伤的抵抗性和在电弧后能够阻止高电压的能力，同时为用于生产电弧屏蔽的传统合金组合提供较低成本的替代方案。 在某些实施方案中，合金组合物包括铜和/或与铜化学相容的元素和另一组分，例如但不限于铁，不锈钢，铌，钼，钒，碳化钨，碳化铬，碳化钒和铬 ，及其合金及其混合物。