公开(公告)号：US20210305069A1

公开(公告)日：2021-09-30

申请号：US17212485

申请日：2021-03-25

Applicant: Ebara Corporation

Inventor： Takayuki KAJIKAWA ,  Takeshi IIZUMI ,  Masayoshi IMAI

IPC: H01L21/67 ,  B08B1/04 ,  B08B1/00 ,  B08B3/08 ,  B08B13/00

Abstract: As an aspect of the present invention, a cleaning apparatus for cleaning member has a holding part 100 holding a cleaning member assembly 1 having a cleaning member 90; an inner cleaning liquid supply part 110; an outer cleaning liquid supply part 120; and a control part 350 controlling the substrate cleaning apparatus to perform a first process in which the cleaning member 90 is pressed against a dummy substrate Wd at a first pressure and the outer cleaning liquid supply part 120 supplies the cleaning liquid to the dummy substrate Wd, and to perform a second process in which the cleaning member 90 is separated from the dummy substrate Wd or is pressed against the dummy substrate Wd at a second pressure which is equal to or less than the first pressure and the inner cleaning liquid supply part 110 supplies the cleaning liquid.

公开(公告)号：US20240286245A1

公开(公告)日：2024-08-29

申请号：US18584763

申请日：2024-02-22

Applicant: EBARA CORPORATION

Inventor： Shinji KAJITA ,  Jyoji HEIANNA ,  Takayuki KAJIKAWA ,  Masamitsu AGARI

IPC: B24B37/34 ,  B05C5/02 ,  B08B3/02

CPC classification number: B24B37/34 ,  B05C5/0212 ,  B08B3/02

Abstract: A substrate treatment apparatus includes: a pretreatment unit that performs a hydrophilic process on a pre-polishing back surface of a substrate; and a polishing unit that polishes a front surface of the substrate having the back surface subjected to the hydrophilic process performed by the pretreatment unit.

公开(公告)号：US20230191460A1

公开(公告)日：2023-06-22

申请号：US17924939

申请日：2021-05-14

Applicant: EBARA CORPORATION

Inventor： Yuki TANAKA ,  Takeshi IIZUMI ,  Takayuki KAJIKAWA

IPC: B08B3/02

CPC classification number: B08B3/02 ,  B08B2240/00 ,  H01L21/67005

Abstract: A cleaning device includes: a substrate rotation mechanism that holds and rotates a substrate around center axis thereof; a first single-tube nozzle that discharges first cleaning liquid toward a top surface of the substrate; and a second single-tube nozzle that discharges second cleaning liquid toward the top surface of the substrate. The first single-tube nozzle and the second single-tube nozzle are disposed such that the second single-tube nozzle discharges the second cleaning liquid in a forward direction of a rotation direction of the substrate at a position farther away from the center of the substrate than a landing position of the first cleaning liquid, and a part is generated in which liquid flow on the top surface of the substrate after landing of the first cleaning liquid and liquid flow on the top surface of the substrate after landing of the second cleaning liquid are combined.