-
公开(公告)号：US09670438B2
公开(公告)日：2017-06-06
申请号：US14993316
申请日：2016-01-12
Applicant: Ecolab USA Inc.
Inventor： Stephen B. Christensen , Jessica R. Bull , Kirsten M. Weeks , Dawn N. Lock , Joanna Ai Pham
CPC classification number: C11D11/0017 , C11D1/83 , C11D3/08 , C11D3/2075 , C11D3/2086 , C11D3/33 , C11D17/06
Abstract: A composition having a pH of less than 7 and including one or more surfactants, one or more chelating agents, and one or more acid in an aqueous solvents is used to treat stains on a textile caused by sunscreen lotion. Sunscreen stains in textiles can be reduced to a Δb* of 5 or less as compared to the textile before staining. The method includes preparing a use solution having a pH of less than 7 by applying to the wash solution a solid composition comprising about 15 to about 60 wt-% of surfactants; about 4 to about 18 wt-% chelating agents; and about 10 to about 40 wt-% of an acid or a salt thereof, and washing the textile in the wash solution, where the method is capable or reducing the stain in the textile to a Δb* of 7 or less as compared to the textile before staining.
-
公开(公告)号：US09222058B2
公开(公告)日：2015-12-29
申请号：US13797082
申请日：2013-03-12
Applicant: Ecolab USA Inc.
Inventor： Dawn N. Lock , Stephan M. Hubig , Kim R. Smith , Joshua A. Ackerman
CPC classification number: C11D1/75 , C11D1/72 , C11D3/042 , C11D3/2041 , C11D3/2068 , C11D3/2075 , C11D3/2079 , C11D3/2082 , C11D3/30 , C11D3/349 , C11D3/43
Abstract: The invention is directed to a cleaning composition and method for reducing yellow stains caused by sunscreen components such as avobenzone, oxybenzone, homosalate, octinoxate, octisalate, octocrylene or combinations thereof. The cleaning composition employs a synergistic combination of an amine oxide/solvent and a souring agent.
Abstract translation: 本发明涉及一种清洁组合物和减少由防晒组分如阿伏苯宗，羟苯酮，高铬酸盐，辛酸，辛辛酸酯，辛烯腈或其组合引起的黄斑的清洗组合物和方法。 清洁组合物采用氧化胺/溶剂和酸化剂的协同组合。
-
公开(公告)号：US20160222329A1
公开(公告)日：2016-08-04
申请号：US14993316
申请日：2016-01-12
Applicant: Ecolab USA Inc.
Inventor： Stephen B. Christensen , Jessica R. Bull , Kirsten M. Weeks , Dawn N. Lock , Joanna Ai Pham
CPC classification number: C11D11/0017 , C11D1/83 , C11D3/08 , C11D3/2075 , C11D3/2086 , C11D3/33 , C11D17/06
Abstract: A composition having a pH of less than 7 and including one or more surfactants, one or more chelating agents, and one or more acid in an aqueous solvents is used to treat stains on a textile caused by sunscreen lotion. Sunscreen stains in textiles can be reduced to a Δb* of 5 or less as compared to the textile before staining. The method includes preparing a use solution having a pH of less than 7 by applying to the wash solution a solid composition comprising about 15 to about 60 wt-% of surfactants; about 4 to about 18 wt-% chelating agents; and about 10 to about 40 wt-% of an acid or a salt thereof, and washing the textile in the wash solution, where the method is capable or reducing the stain in the textile to a Δb* of 7 or less as compared to the textile before staining.
Abstract translation: 使用pH小于7且包含一种或多种表面活性剂，一种或多种螯合剂和一种或多种酸在水性溶剂中的组合物来处理由防晒乳液引起的织物上的污渍。 与染色前的纺织品相比，纺织品中的防晒剂污渍可以降低到5以下的Δb*。 该方法包括通过向洗涤溶液施加包含约15至约60重量％的表面活性剂的固体组合物来制备pH小于7的使用溶液; 约4至约18重量％的螯合剂; 和约10至约40重量％的酸或其盐，并且在洗涤溶液中洗涤纺织品，其中该方法能够或将织物中的污渍降低至7b以下的Δb*，与 纺织品染色前。
-
公开(公告)号：US20140259440A1
公开(公告)日：2014-09-18
申请号：US13797082
申请日：2013-03-12
Applicant: ECOLAB USA INC.
Inventor： Dawn N. Lock , Stephan M. Hubig , Kim R. Smith , Joshua A. Ackerman
CPC classification number: C11D1/75 , C11D1/72 , C11D3/042 , C11D3/2041 , C11D3/2068 , C11D3/2075 , C11D3/2079 , C11D3/2082 , C11D3/30 , C11D3/349 , C11D3/43
Abstract: The invention is directed to a cleaning composition and method for reducing yellow stains caused by sunscreen components such as avobenzone, oxybenzone, homosalate, octinoxate, octisalate, octocrylene or combinations thereof. The cleaning composition employs a synergistic combination of an amine oxide/solvent and a souring agent.
Abstract translation: 本发明涉及一种清洁组合物和减少由防晒组分如阿伏苯宗，羟苯酮，高铬酸盐，辛酸，辛辛酸酯，辛烯腈或其组合引起的黄斑的清洗组合物和方法。 清洁组合物采用氧化胺/溶剂和酸化剂的协同组合。
-
-
-
Search Results
4
records
(took 0.012 seconds)
