公开(公告)号：US20160250714A1

公开(公告)日：2016-09-01

申请号：US15055037

申请日：2016-02-26

Applicant: ELECTRO SCIENTIFIC INDUSTRIES, INC.

Inventor： Haibin Zhang ,  Chuan Yang ,  Mark Alan Unrath ,  Martin Orrick

IPC: B23K26/0622 ,  B23K26/06 ,  B23K26/352 ,  B23K26/00

Abstract: A laser processing system includes a first positioning system (1044) for imparting first relative movement of a beam axis along a beam trajectory (1062) with respect to a workpiece (1060), a processor for determining a second relative movement of the beam axis (1061) along a plurality of dither rows, a second positioning system (1042) for imparting the second relative movement, and a laser source (1046) for emitting laser beam pulses. The laser beam pulses of individually selected energies can be directed to individually selected transverse spot locations (5310) one or more times during a primary laser pass to permit three-dimensional patterning. The laser beam pulses can also be directed to the spatially identical, overlapping, or non-overlapping neighboring spot area locations on the workpiece in a temporally nonsequential order.

Abstract translation: 激光处理系统包括用于相对于工件（1060）沿光束轨迹（1062）传递光束轴线的第一相对运动的第一定位系统（1044），用于确定光束轴的第二相对运动的处理器 1061），用于施加第二相对运动的第二定位系统（1042）和用于发射激光束脉冲的激光源（1046）。 单独选择的能量的激光束脉冲可以在主激光通过期间被引导到单独选择的横向光斑位置（5310）一次或多次以允许三维图案化。 激光束脉冲也可以以时间上不连续的顺序被引导到工件上的空间上相同，重叠或非重叠的相邻斑点区域位置。

公开(公告)号：US10507544B2

公开(公告)日：2019-12-17

申请号：US15055037

申请日：2016-02-26

Applicant: ELECTRO SCIENTIFIC INDUSTRIES, INC.

Inventor： Haibin Zhang ,  Chuan Yang ,  Mark Alan Unrath ,  Martin Orrick

IPC: B23K26/36 ,  B23K26/0622 ,  B23K26/06

Abstract: A laser processing system includes a first positioning system (1044) for imparting first relative movement of a beam axis along a beam trajectory (1062) with respect to a workpiece (1060), a processor for determining a second relative movement of the beam axis (1061) along a plurality of dither rows, a second positioning system (1042) for imparting the second relative movement, and a laser source (1046) for emitting laser beam pulses. The laser beam pulses of individually selected energies can be directed to individually selected transverse spot locations (5310) one or more times during a primary laser pass to permit three-dimensional patterning. The laser beam pulses can also be directed to the spatially identical, overlapping, or non-overlapping neighboring spot area locations on the workpiece in a temporally nonsequential order.