PROCESS FOR THE PRODUCTION OF SILICON DIOXIDE PARTICLES
    1.
    发明申请
    PROCESS FOR THE PRODUCTION OF SILICON DIOXIDE PARTICLES 有权
    生产二氧化硅颗粒的方法

    公开(公告)号:US20160318769A1

    公开(公告)日:2016-11-03

    申请号:US15107769

    申请日:2015-02-23

    Applicant: ELKEM AS

    CPC classification number: C01B33/182 C01P2002/02 C01P2004/32 C01P2006/12

    Abstract: The present invention relates to a process for producing spherical submicron particles of amorphous silicon dioxide, in which silicon dioxide and a reducing agent is injected into a reaction vessel of zirconium oxide in molten state, said zirconium oxide is serving as a heat reservoir, in which silicon dioxide reacts with the reducing agent producing a silicon-sub-oxide vapour, said silicon-sub-oxide vapour is oxidised into said spherical submicron silicon oxide particles.

    Abstract translation: 本发明涉及一种制备无定形二氧化硅的球形亚微米颗粒的方法,其中将二氧化硅和还原剂注入熔融状态的氧化锆的反应容器中,所述氧化锆用作储热器,其中 二氧化硅与还原剂反应产生硅 - 氧化物蒸气,所述硅 - 氧化物蒸汽被氧化成所述球形亚微米氧化硅颗粒。

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