公开(公告)号：US20250109483A1

公开(公告)日：2025-04-03

申请号：US18980228

申请日：2024-12-13

Applicant: ENTEGRIS, INC.

Inventor： Nilesh Gunda ,  Jijun Lao ,  Samuel J. Angeloni ,  Wolfram Neff

IPC: C23C14/34 ,  C23C14/08 ,  C23C14/58 ,  C23C28/04 ,  H01L21/02 ,  H01L21/285 ,  H01L21/324 ,  H01L23/00

Abstract: Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium wherein the yttrium oxide is deposited using an AC power source. The film has a fluorine atomic % of at least 10 at a depth of 30% of the total thickness of the film and the film has no subsurface cracks below the surface of the film visible when using a laser confocal microscope to view the full depth of the film at a magnification of 1000×.

公开(公告)号：US20220154325A1

公开(公告)日：2022-05-19

申请号：US17527228

申请日：2021-11-16

Applicant: ENTEGRIS, INC.

Inventor： Nilesh Gunda ,  Jijun Lao ,  Samuel J. Angeloni ,  Wolfram Neff

IPC: C23C14/34 ,  H01L21/285 ,  H01L21/324 ,  H01L21/02 ,  H01L23/00

Abstract: Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium wherein the yttrium oxide is deposited using an AC power source. The film has a fluorine atomic % of at least 10 at a depth of 30% of the total thickness of the film and the film has no subsurface cracks below the surface of the film visible when using a laser confocal microscope to view the full depth of the film at a magnification of 1000×.