Gas treatment apparatus
    1.
    发明授权

    公开(公告)号:US10150120B2

    公开(公告)日:2018-12-11

    申请号:US15031096

    申请日:2014-09-30

    Abstract: A gas treatment includes: a gas scrubber chamber operable to receive an effluent gas stream originating from a manufacturing process tool to be scrubbed therewithin to provide a scrubbed gas stream; and an electrostatic precipitation chamber operable to receive the scrubbed gas stream to be treated therewithin to provide a treated gas stream, one of the gas scrubber chamber and the electrostatic precipitation chamber defining a first chamber and another of the gas scrubber chamber and the electrostatic precipitation chamber defining a second chamber, the first chamber being configured to surround the second chamber. In this way, the first chamber and the second chamber can share the same volume.

    GAS TREATMENT APPARATUS
    2.
    发明申请
    GAS TREATMENT APPARATUS 审中-公开
    气体处理设备

    公开(公告)号:US20160236205A1

    公开(公告)日:2016-08-18

    申请号:US15031096

    申请日:2014-09-30

    Abstract: A gas treatment includes: a gas scrubber chamber operable to receive an effluent gas stream originating from a manufacturing process tool to be scrubbed therewithin to provide a scrubbed gas stream; and an electrostatic precipitation chamber operable to receive the scrubbed gas stream to be treated therewithin to provide a treated gas stream, one of the gas scrubber chamber and the electrostatic precipitation chamber defining a first chamber and another of the gas scrubber chamber and the electrostatic precipitation chamber defining a second chamber, the first chamber being configured to surround the second chamber. In this way, the first chamber and the second chamber can share the same volume.

    Abstract translation: 气体处理包括:气体洗涤器室,其可操作以接收来自制造工艺工具的流出气体流,以在其中进行擦洗以提供洗涤气流; 以及静电沉淀室,其可操作以接收待处理的洗涤气体流以提供经处理的气流,气体洗涤室和静电沉淀室中的一个限定第一室,另一个气体洗涤室和静电沉淀室 限定第二室,所述第一室被构造成围绕所述第二室。 以这种方式,第一室和第二室可以共享相同的体积。

Patent Agency Ranking