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公开(公告)号:US4171977A
公开(公告)日:1979-10-23
申请号:US824195
申请日:1977-08-12
IPC分类号: C08F2/00 , C08F2/50 , C08F290/00 , C08F299/00 , C08G59/00 , C08G59/40 , G03F7/032 , G03C1/68
CPC分类号: G03F7/032 , Y10S430/118
摘要: A photopolymerizable composition having improved thermal stability comprising (a) a polymerizable ethylenically unsaturated monomer, (b) an initiator represented by the general formula (I): ##STR1## wherein Z represents the non-metallic atoms necessary to complete a nitrogen-containing heterocyclic nucleus; R.sup.1 represents an unsubstituted or substituted alkyl group; and R.sup.2 represents an unsubstituted or substituted alkyl group, an unsubstituted or substituted aryl group, or a thienyl group; and (c) a chlorinated polyolefin as a binder and additionally containing (d) about 1 to about 30% by weight of an epoxy compound.
摘要翻译: 一种具有改进的热稳定性的可光聚合组合物,其包含(a)可聚合烯属不饱和单体,(b)由通式(I)表示的引发剂:其中Z表示完成氮所必需的非金属原子 含杂环核; R1表示未取代或取代的烷基; R2表示未取代或取代的烷基,未取代或取代的芳基或噻吩基; 和(c)作为粘合剂的氯化聚烯烃,另外含有(d)约1至约30重量%的环氧化合物。
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公开(公告)号:US4370404A
公开(公告)日:1983-01-25
申请号:US318495
申请日:1981-11-05
CPC分类号: B41N3/08 , G03F7/40 , Y10S430/162
摘要: A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.
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公开(公告)号:US4328304A
公开(公告)日:1982-05-04
申请号:US078267
申请日:1979-09-24
CPC分类号: B41N3/08 , G03F7/40 , Y10S430/162
摘要: A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.
摘要翻译: 公开了一种新颖的脱敏溶液,其应用于涂覆有可光聚合组合物的感光层的平版印刷版的表面,脱敏溶液含有亲水胶体,自由基聚合抑制剂和水。
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