公开(公告)号：US20020158643A1

公开(公告)日：2002-10-31

申请号：US10047980

申请日：2002-01-11

Applicant: Electroglas Inc.

Inventor： Leda Villalobos

IPC: G01R031/308

CPC classification number: H01L21/67288 ,  H01L24/10 ,  H01L2224/1403 ,  H01L2924/00014 ,  H01L2924/01079 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/00 ,  H01L2224/0401

Abstract: Plural light sources are provided for directing ring patterns of light toward at least one reflective bump formed on and projecting from a first wafer surface of a semiconductor wafer. The intensity of light from the light sources may be varied and may be varied independently of one another. A method and apparatus for adjusting at least one pixel value is also disclosed.

Abstract translation: 多个光源被提供用于将环形图案引向形成在半导体晶片的第一晶片表面上并从半导体晶片的第一晶片表面突出的至少一个反射凸块。 来自光源的光的强度可以变化并且可以彼此独立地变化。 还公开了一种用于调整至少一个像素值的方法和装置。