EPITAXIAL SOURCE OR DRAIN REGION WITH A WRAPPED CONDUCTIVE CONTACT

    公开(公告)号:US20240204048A1

    公开(公告)日:2024-06-20

    申请号:US18082851

    申请日:2022-12-16

    Inventor: Hwichan Jun

    Abstract: Techniques are provided herein to form semiconductor devices having one or more epitaxial source or drain regions wrapped by a conductive contact to form an improved ohmic contact. A first semiconductor device includes a first semiconductor region extending between a first source or drain region and a second source or drain region, and a second semiconductor device includes a second semiconductor region extending between the first source or drain region and a third source or drain region. The first and second semiconductor devices include a subfin region adjacent to a dielectric layer. A conductive layer extends around the first source or drain region such that the conductive layer at least contacts the sidewalls of the first source or drain region and both upper and lower surfaces of the source or drain region. A dielectric layer is also present between the conductive contact and the subfin region.

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