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    FABRICATION OF METALLIC OPTICAL METASURFACES
    2.
    发明申请
    FABRICATION OF METALLIC OPTICAL METASURFACES 审中-公开

    公开(公告)号：US20190301025A1

    公开(公告)日：2019-10-03

    申请号：US15943350

    申请日：2018-04-02

    申请人： Elwha LLC

    发明人： Gleb M. Akselrod ,  Erik Edward Josberger ,  Mark C. Weidman

    IPC分类号： C23C28/00 ,  G03H1/02 ,  C25D5/02 ,  C25D3/38 ,  C25D5/48 ,  C25D5/34 ,  C23C14/34 ,  C23C14/18 ,  C23C14/02

    摘要： The disclosure provides a method for fabricating a metallic optical metasurface having an array of hologram elements. The method includes forming a first copper layer protected with a conducting or dielectric barrier layer over a backplane structure by a damascene process. The first copper layer comprises a plurality of nano-gaps vertically extending from the backplane structure. The plurality of nano-gaps is filled with a dielectric material. The method also includes removing the dielectric material and a portion of the conducting or dielectric barrier layer to expose the portions in the nano-gaps of the first copper layer. The method may further include depositing a dielectric coating layer over the top portion and exposed side portions of the first copper layer to form a protected first copper layer, and filling the gaps with an electrically-tunable dielectric material that has an electrically-tunable refractive index.