公开(公告)号：US20170062172A1

公开(公告)日：2017-03-02

申请号：US15246821

申请日：2016-08-25

Applicant: Energy Sciences Inc.

Inventor： Imtiaz J. Rangwalla ,  Rich Alexy ,  Edward Maguire

IPC: H01J37/02 ,  H01J37/30

CPC classification number: G21K5/00 ,  G21K5/02

Abstract: An electron beam processing apparatus for treating a substrate is provided. The apparatus has an electron beam generating assembly housed in a chamber that includes a filament for generating a plurality of electrons upon heating. The apparatus may also have a foil support assembly that is configured to direct the plurality of electrons through a thin foil out of the chamber. The apparatus may further have a processing assembly that is configured to pass the substrate by the thin foil so that the plurality of electrons penetrates the substrate and cause a chemical reaction. A distance of an air gap between the thin foil and the substrate may be adjustable.

Abstract translation: 提供了一种用于处理基板的电子束处理装置。 该装置具有容纳在包括用于在加热时产生多个电子的细丝的室中的电子束产生组件。 该装置还可以具有箔支撑组件，其被配置成将多个电子引导通过薄膜离开室。 该设备还可以具有处理组件，该处理组件被配置为通过薄箔使衬底通过，使得多个电子穿透衬底并引起化学反应。 薄箔和基板之间的气隙的距离可以是可调节的。