Electron beam window tile having non-uniform cross-sections

    公开(公告)号:US09715990B2

    公开(公告)日:2017-07-25

    申请号:US14974928

    申请日:2015-12-18

    摘要: Window tiles for electron beam systems are provided. The window tiles can comprise a first surface and a second surface, and one or more features extending from the first surface to the second surface. The one or more features can have a non-uniform or tapered cross-section between the first surface and the second surface. The first surface can be configured to be exposed to vacuum conditions and can be configured to receive electrons accelerated from an electron beam generator. The second surface can be configured to allow electrons to pass through to a foil. The window tiles can improve electron beam processing systems for example by increasing electron throughput, lowering power consumption, reducing heat absorption to the foil, improving and increasing foil life, and potentially allowing for use of smaller and cheaper machines in electron beam processing.

    ELECTRON BEAM APPARATUS WITH ADJUSTABLE AIR GAP
    2.
    发明申请
    ELECTRON BEAM APPARATUS WITH ADJUSTABLE AIR GAP 审中-公开
    电子束设备与可调节的空气隙

    公开(公告)号:US20170062172A1

    公开(公告)日:2017-03-02

    申请号:US15246821

    申请日:2016-08-25

    IPC分类号: H01J37/02 H01J37/30

    CPC分类号: G21K5/00 G21K5/02

    摘要: An electron beam processing apparatus for treating a substrate is provided. The apparatus has an electron beam generating assembly housed in a chamber that includes a filament for generating a plurality of electrons upon heating. The apparatus may also have a foil support assembly that is configured to direct the plurality of electrons through a thin foil out of the chamber. The apparatus may further have a processing assembly that is configured to pass the substrate by the thin foil so that the plurality of electrons penetrates the substrate and cause a chemical reaction. A distance of an air gap between the thin foil and the substrate may be adjustable.

    摘要翻译: 提供了一种用于处理基板的电子束处理装置。 该装置具有容纳在包括用于在加热时产生多个电子的细丝的室中的电子束产生组件。 该装置还可以具有箔支撑组件,其被配置成将多个电子引导通过薄膜离开室。 该设备还可以具有处理组件,该处理组件被配置为通过薄箔使衬底通过,使得多个电子穿透衬底并引起化学反应。 薄箔和基板之间的气隙的距离可以是可调节的。

    ELECTRON BEAM WINDOW TILE HAVING NON-UNIFORM CROSS-SECTIONS TECHNICAL FIELD
    3.
    发明申请
    ELECTRON BEAM WINDOW TILE HAVING NON-UNIFORM CROSS-SECTIONS TECHNICAL FIELD 有权
    具有非均匀交叉部分的电子束窗口技术领域

    公开(公告)号:US20160181056A1

    公开(公告)日:2016-06-23

    申请号:US14974928

    申请日:2015-12-18

    IPC分类号: H01J37/147 H01J37/09

    摘要: Window tiles for electron beam systems are provided. The window tiles can comprise a first surface and a second surface, and one or more features extending from the first surface to the second surface. The one or more features can have a non-uniform or tapered cross-section between the first surface and the second surface. The first surface can be configured to be exposed to vacuum conditions and can be configured to receive electrons accelerated from an electron beam generator. The second surface can be configured to allow electrons to pass through to a foil. The window tiles can improve electron beam processing systems for example by increasing electron throughput, lowering power consumption, reducing heat absorption to the foil, improving and increasing foil life, and potentially allowing for use of smaller and cheaper machines in electron beam processing.

    摘要翻译: 提供电子束系统的窗瓦。 窗瓦可以包括第一表面和第二表面以及从第一表面延伸到第二表面的一个或多个特征。 一个或多个特征可以在第一表面和第二表面之间具有不均匀或渐缩的横截面。 第一表面可以被配置为暴露于真空条件,并且可以被配置为接收从电子束发生器加速的电子。 第二表面可以被配置为允许电子通过箔。 窗瓦可以改善电子束处理系统,例如通过增加电子通量,降低功耗,减少对箔的热吸收,改善和延长箔寿命,以及潜在地允许在电子束处理中使用更小和更便宜的机器。