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公开(公告)号：US20090182172A1
公开(公告)日：2009-07-16
申请号：US12221517
申请日：2008-08-04
IPC分类号： C07F5/02
CPC分类号： G03H1/02 , C07C381/12 , C07F5/027 , G03F7/0045 , G03F7/029 , G03F7/031 , G03F7/038 , G03F7/0755 , G03H2260/12
摘要： The present invention discloses a new class of triarylsulfonium salt photoacid generators (PAGs), which are thermally stable and can be activated by long wavelength UV or visible light. The sulfonium PAGs of the present invention are additionally soluble in monomers that can be polymerized by cationic polymerization chemistry, and mixtures of said sulfonium PAGs and monomers can be stored for long periods of time without undergoing polymerization. Furthermore, typical holographic recording media comprising one of these sulfonium PAGs, polymerizable monomer(s), a sensitizing dye, and a binder can be stored for long periods of time without exhibiting significant loss of recording sensitivity. Preferred sulfonium PAGs of the present invention are sulfonium PAGs substituted with one or more fluoro or fluoroalkyl groups.
摘要翻译： 本发明公开了一类新的三芳基锍盐光致酸发生剂（PAG），它们是热稳定的并且可以通过长波长的紫外或可见光活化。 本发明的锍PAG还可溶于可通过阳离子聚合化学反应聚合的单体，并且所述锍PAG和单体的混合物可以长时间储存而不经历聚合。 此外，包含这些锍PAG，可聚合单体，敏化染料和粘合剂中的一种的典型全息记录介质可以长时间储存，而不会显着降低记录灵敏度。 本发明优选的锍PAG是被一个或多个氟代或氟烷基取代的锍PAG。
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公开(公告)号：US20090042105A1
公开(公告)日：2009-02-12
申请号：US12070913
申请日：2008-02-21
CPC分类号： G03F7/0045 , C09B3/78 , C09B3/82 , G03F7/038 , G03F7/0755 , G11B7/24044 , G11B7/244 , G11B7/246 , G11B7/249
摘要： Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present invention discloses a number of new 5-alkynyl substituted napthacene photosensitizing dyes that have low extinction coefficients coupled with good sensitizing properties, such that the problems associated with the photosensitizing dyes absorbing light are significantly reduced.
摘要翻译： 光敏染料通常与全息记录介质中的光致酸发生器结合使用。 常规的光敏染料通常在以足够的浓度使用时具有明显的光吸收来限制，使得光的强度随着渗入记录介质而显着降低。 本发明公开了许多具有低消光系数和良好的敏化性能的新的5-炔基取代的萘并茂光敏染料，使得与吸收光的光敏染料相关的问题显着降低。
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公开(公告)号：US07892702B2
公开(公告)日：2011-02-22
申请号：US12070913
申请日：2008-02-21
CPC分类号： G03F7/0045 , C09B3/78 , C09B3/82 , G03F7/038 , G03F7/0755 , G11B7/24044 , G11B7/244 , G11B7/246 , G11B7/249
摘要： Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present invention discloses a number of new 5-alkynyl substituted napthacene photosensitizing dyes that have low extinction coefficients coupled with good sensitizing properties, such that the problems associated with the photosensitizing dyes absorbing light are significantly reduced.
摘要翻译： 光敏染料通常与全息记录介质中的光致酸发生器结合使用。 常规的光敏染料通常在以足够的浓度使用时具有明显的光吸收来限制，使得光的强度随着渗入记录介质而显着降低。 本发明公开了许多具有低消光系数和良好的敏化性能的新的5-炔基取代的萘并茂光敏染料，使得与吸收光的光敏染料相关的问题显着降低。
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4.发明申请SENSITIZER DYES FOR PHOTOACID GENERATING SYSTEMS USING SHORT VISIBLE WAVELENGTHS 审中-公开光敏发生系统的敏感度使用短视觉波长公开(公告)号：US20100039684A1
公开(公告)日：2010-02-18
申请号：US12310126
申请日：2007-08-10
CPC分类号： G03F7/0045 , C07C15/62 , C09B57/00 , C09B69/008 , G03F7/001 , G03F7/038 , G03H1/02 , G03H2001/0264 , G03H2260/12 , G11B7/24044 , G11B7/245 , G11B7/246
摘要： Photosensitizing dyes are often used in conjunction with a photoacid generator in photopolymerizable materials and in holographic recording media. Typical dyes for these materials are used in the region of the visible spectrum for wavelengths greater than about 450 run. The present invention discloses a number of new 1,4-alkynyl substituted napthalene photosensitizing dyes that have suitably low extinction coefficients coupled with good sensitizing properties for use in such materials at wavelengths in the visible spectrum region of about 400 nm.
摘要翻译： 光敏染料通常与可光聚合材料和全息记录介质中的光致酸产生剂结合使用。 这些材料的典型染料用于波长大于约450nm的可见光谱区域。 本发明公开了许多具有合适的低消光系数的新的1,4-炔基取代的萘光敏染料，其具有良好的敏化性能，用于在约400nm的可见光谱区域中的波长处的这种材料。
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