Fluoroarylsulfonium photoacid generators
    1.
    发明申请
    Fluoroarylsulfonium photoacid generators 审中-公开
    氟芳基锍光酸发生剂

    公开(公告)号:US20090182172A1

    公开(公告)日:2009-07-16

    申请号:US12221517

    申请日:2008-08-04

    IPC分类号: C07F5/02

    摘要: The present invention discloses a new class of triarylsulfonium salt photoacid generators (PAGs), which are thermally stable and can be activated by long wavelength UV or visible light. The sulfonium PAGs of the present invention are additionally soluble in monomers that can be polymerized by cationic polymerization chemistry, and mixtures of said sulfonium PAGs and monomers can be stored for long periods of time without undergoing polymerization. Furthermore, typical holographic recording media comprising one of these sulfonium PAGs, polymerizable monomer(s), a sensitizing dye, and a binder can be stored for long periods of time without exhibiting significant loss of recording sensitivity. Preferred sulfonium PAGs of the present invention are sulfonium PAGs substituted with one or more fluoro or fluoroalkyl groups.

    摘要翻译: 本发明公开了一类新的三芳基锍盐光致酸发生剂(PAG),它们是热稳定的并且可以通过长波长的紫外或可见光活化。 本发明的锍PAG还可溶于可通过阳离子聚合化学反应聚合的单体,并且所述锍PAG和单体的混合物可以长时间储存​​而不经历聚合。 此外,包含这些锍PAG,可聚合单体,敏化染料和粘合剂中的一种的典型全息记录介质可以长时间储存​​,而不会显着降低记录灵敏度。 本发明优选的锍PAG是被一个或多个氟代或氟烷基取代的锍PAG。

    Sensitizer dyes for photoacid generating systems
    2.
    发明申请
    Sensitizer dyes for photoacid generating systems 失效
    用于光致酸产生系统的敏化剂染料

    公开(公告)号:US20090042105A1

    公开(公告)日:2009-02-12

    申请号:US12070913

    申请日:2008-02-21

    摘要: Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present invention discloses a number of new 5-alkynyl substituted napthacene photosensitizing dyes that have low extinction coefficients coupled with good sensitizing properties, such that the problems associated with the photosensitizing dyes absorbing light are significantly reduced.

    摘要翻译: 光敏染料通常与全息记录介质中的光致酸发生器结合使用。 常规的光敏染料通常在以足够的浓度使用时具有明显的光吸收来限制,使得光的强度随着渗入记录介质而显着降低。 本发明公开了许多具有低消光系数和良好的敏化性能的新的5-炔基取代的萘并茂光敏染料,使得与吸收光的光敏染料相关的问题显着降低。

    Sensitizer dyes for photoacid generating systems
    3.
    发明授权
    Sensitizer dyes for photoacid generating systems 失效
    用于光致酸产生系统的敏化剂染料

    公开(公告)号:US07892702B2

    公开(公告)日:2011-02-22

    申请号:US12070913

    申请日:2008-02-21

    摘要: Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present invention discloses a number of new 5-alkynyl substituted napthacene photosensitizing dyes that have low extinction coefficients coupled with good sensitizing properties, such that the problems associated with the photosensitizing dyes absorbing light are significantly reduced.

    摘要翻译: 光敏染料通常与全息记录介质中的光致酸发生器结合使用。 常规的光敏染料通常在以足够的浓度使用时具有明显的光吸收来限制,使得光的强度随着渗入记录介质而显着降低。 本发明公开了许多具有低消光系数和良好的敏化性能的新的5-炔基取代的萘并茂光敏染料,使得与吸收光的光敏染料相关的问题显着降低。

    Process and composition for generation of acid

    公开(公告)号:US06242154B1

    公开(公告)日:2001-06-05

    申请号:US09210101

    申请日:1998-12-11

    IPC分类号: G03C1492

    CPC分类号: G03C1/73 B41M5/30 G03F7/0045

    摘要: A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.

    Process and composition for generation of acid
    6.
    发明授权
    Process and composition for generation of acid 失效
    生成酸的方法和组成

    公开(公告)号:US6110638A

    公开(公告)日:2000-08-29

    申请号:US757195

    申请日:1996-11-27

    摘要: A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group, followed by loss of a proton from the secondary acid generator to form an unstable intermediate, which then fragments with loss of the second leaving group, accompanied by either (a) loss of a second proton; or (b) addition of a proton-containing nucleophile, followed by loss of a proton, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.

    摘要翻译: 酸的制造方法使用包含能够产生第一酸的第一产酸成分的培养基和二次酸发生剂,该二次酸发生剂能够热分解形成二次酸,二次酸的热分解 酸发生剂由第一种酸催化。 介质的至少一部分被暴露以便从第一产酸组分形成第一种酸; 然后将介质加热以在介质的暴露部分中引起二次酸发生器的酸催化热分解和二次酸的形成。 二次酸产生器具有带有第一离去基团的第一位点和带有第二离去基团的第二位点,第一离去基团能够被第一酸质子化,同时排出第一离去基团,然后丢失质子 从次级酸产生器形成不稳定的中间体,然后随着第二离去基团的损失而断裂,伴随着(a)第二质子的损失; 或者(b)加入含质子的亲核试剂,然后与质子组合丢失质子,第二离去基团与质子结合,形成二次酸。 该方法的优选变体是在美国专利No. 第5,286,612号; 5,334,489; 5,395,736; 5,441,850和5,453,345。

    Holographic medium and process for use thereof
    7.
    发明授权
    Holographic medium and process for use thereof 失效
    全息介质及其使用方法

    公开(公告)号:US06489065B1

    公开(公告)日:2002-12-03

    申请号:US08649823

    申请日:1996-05-17

    IPC分类号: G03H102

    摘要: A holographic recording medium comprises (a) an acid generator capable of generating an acid upon exposure to actinic radiation; and (b) a polymer comprising a plurality of high refractive index moieties, a plurality of low refractive index moieties, and a plurality of acid-sensitive linking groups connecting the high and low refractive index moieties. When an interference pattern is formed within this medium, in the light areas of this interference pattern acid is generated by the acid generator and cleaves the acid-sensitive linking groups, thereby causing separation of either the high or the low refractive index moieties from the polymer, and formation of a hologram within the medium.

    摘要翻译: 全息记录介质包括(a)能够在暴露于光化辐射时产生酸的酸发生剂; 和(b)包含多个高折射率部分,多个低折射率部分和连接高折射率部分和低折射率部分的多个酸敏感连接基团的聚合物。 当在该介质中形成干涉图案时,在该干涉图形的光区域中,酸由酸产生器产生并切割酸敏感性连接基团,从而导致高分子折射率部分或低折射率部分与聚合物分离 ,以及在介质内形成全息图。

    Process and composition for generation of acid
    9.
    发明授权
    Process and composition for generation of acid 有权
    生成酸的方法和组成

    公开(公告)号:US06307085B1

    公开(公告)日:2001-10-23

    申请号:US09627939

    申请日:2000-07-28

    IPC分类号: C07F902

    CPC分类号: G03C1/73 B41M5/30 G03F7/0045

    摘要: A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.

    摘要翻译: 酸的制造方法使用包含能够产生第一酸的第一产酸成分的培养基和二次酸发生剂,该二次酸发生剂能够热分解形成二次酸,二次酸的热分解 酸发生剂由第一种酸催化。 介质的至少一部分被暴露以便从第一产酸组分形成第一种酸; 然后将介质加热以在介质的暴露部分中引起二次酸发生器的酸催化热分解和二次酸的形成。 二次酸发生器具有带有第一离去基团的第一位点和带有第二离去基团的第二位点,第一离去基团能够被第一酸质子化,同时排出第一离去基团以形成亲电子加成的阳离子 涉及在相邻位置处带有质子的不饱和试剂和在相邻位置处含质子的亲核基团,随后试剂上的所述质子损失,第二离去基团被所述亲核基团置换,第二离去基团, 与质子结合形成二次酸。 该方法的优选变体是在美国专利No. 第5,286,612号; 5,334,489; 5,395,736; 5,441,850和5,453,345。

    Process and composition for generation of acid
    10.
    发明授权
    Process and composition for generation of acid 失效
    生成酸的方法和组成

    公开(公告)号:US5914213A

    公开(公告)日:1999-06-22

    申请号:US944284

    申请日:1997-10-06

    CPC分类号: G03C1/73 B41M5/30 G03F7/0045

    摘要: A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.

    摘要翻译: 酸的制造方法使用包含能够产生第一酸的第一产酸成分的培养基和二次酸发生剂,该二次酸发生剂能够热分解形成二次酸,二次酸的热分解 酸发生剂由第一种酸催化。 介质的至少一部分被暴露以便从第一产酸组分形成第一种酸; 然后将介质加热以在介质的暴露部分中引起二次酸发生器的酸催化热分解和二次酸的形成。 二次酸发生器具有带有第一离去基团的第一位点和带有第二离去基团的第二位点,第一离去基团能够被第一酸质子化,同时排出第一离去基团以形成亲电子加成的阳离子 涉及在相邻位置处带有质子的不饱和试剂和在相邻位置处含质子的亲核基团,随后试剂上的所述质子损失,第二离去基团被所述亲核基团置换,第二离去基团, 与质子结合形成二次酸。 该方法的优选变体是在美国专利No. 第5,286,612号; 5,334,489; 5,395,736 5,441,850和5,453,345。