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    Cleaning apparatus, measurement method and calibration method
    1.
    发明授权
    Cleaning apparatus, measurement method and calibration method 有权
    清洁装置，测量方法和校准方法

    公开(公告)号：US08575571B2

    公开(公告)日：2013-11-05

    申请号：US13618624

    申请日：2012-09-14

    申请人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    IPC分类号： G01J1/58

    CPC分类号： G01N21/274 ,  G01N21/70 ,  G01N21/71 ,  G01N29/2418 ,  G01N2021/8416

    摘要： A calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid includes varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak. The liquid is illuminated with ultrasonic waves while varying the concentration of the gas in the liquid and a measured value is measured, using the measurement device, as a concentration of the gas in the liquid when the intensity of the luminescence shows a peak. The measurement device is calibrated based on the measured value and the reference concentration.

    摘要翻译： 用于校准用于测量溶解在液体中的气体的浓度的测量装置的校准方法包括改变溶解在液体中的气体的浓度，并且预先确定作为参考浓度的发光强度的气体的浓度 当用超声波照射液体时产生峰值。 在改变液体中的气体浓度的同时，用超声波照射液体，并且当发光强度显示峰值时，使用测量装置测量液体中气体的浓度的测量值。 测量装置根据测量值和参考浓度进行校准。

    ULTRASONIC CLEANING METHOD
    2.
    发明申请
    ULTRASONIC CLEANING METHOD 审中-公开
    超声波清洗方法

    公开(公告)号：US20130160791A1

    公开(公告)日：2013-06-27

    申请号：US13618784

    申请日：2012-09-14

    申请人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    IPC分类号： B08B3/12

    CPC分类号： B08B3/12 ,  B06B2201/71 ,  H01L21/02052 ,  H01L21/67057

    摘要： An ultrasonic cleaning method for cleaning an object in a solution having a gas dissolved therein includes irradiating ultrasonic waves to the solution having a first dissolved gas concentration. While the ultrasonic waves are being irradiated to the solution, a dissolved gas concentration in the solution is changed from the first dissolved gas concentration to a second dissolved gas concentration that is lower than the first dissolved gas concentration such that sonoluminescence occurs.

    摘要翻译： 一种用于清洗溶解有气体的溶液中的物体的超声波清洗方法包括：在具有第一溶解气体浓度的溶液中照射超声波。 当超声波被照射到溶液时，溶液中的溶解气体浓度从第一溶解气体浓度变为低于第一溶解气体浓度的第二溶解气体浓度，从而发生声发光。

    CLEANING METHOD
    3.
    发明申请
    CLEANING METHOD 审中-公开
    清洁方法

    公开(公告)号：US20130192627A1

    公开(公告)日：2013-08-01

    申请号：US13616746

    申请日：2012-09-14

    申请人： Etsuko Kubo ,  Teruo Haibara ,  Yoshihiro Mori ,  Masashi Uchibe

    发明人： Etsuko Kubo ,  Teruo Haibara ,  Yoshihiro Mori ,  Masashi Uchibe

    IPC分类号： B08B3/12

    CPC分类号： B08B3/12

    摘要： A cleaning method for cleaning an object includes preparing a cleaning liquid. A dissolved nitrogen concentration in the cleaning liquid is adjusted based on a size of a foreign substance to be removed from the object with a highest removal efficiency. The object is dipped in the cleaning liquid while irradiating the cleaning liquid with ultrasonic waves.

    摘要翻译： 用于清洁物体的清洁方法包括制备清洁液体。 基于要从物体除去的异物的尺寸以最高的去除效率调节清洗液中的溶解氮浓度。 在用超声波照射清洗液的同时将物体浸入清洗液中。

    Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus
    4.
    发明授权
    Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus 有权
    溶解氮浓度监测方法，底物清洗方法和基材清洗装置

    公开(公告)号：US08778085B2

    公开(公告)日：2014-07-15

    申请号：US13995568

    申请日：2011-12-13

    申请人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    IPC分类号： B08B3/12

    CPC分类号： G01N29/02 ,  B08B3/12 ,  H01L21/02052 ,  H01L21/67057 ,  H01L21/67253 ,  Y10T436/17 ,  Y10T436/176152 ,  Y10T436/20 ,  Y10T436/207497 ,  Y10T436/209163

    摘要： A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.

    摘要翻译： 溶解氮浓度监测方法用于在将超声波照射到其中浸渍了基材的清洗液上时，监测清洗液的溶解氮浓度。 该方法包括测量由于由超声波照射引起的自由基反应而由水分子产生的氧分子产生的清洗液的溶解氧浓度的增加量。 基于溶解的氮浓度与溶解氧浓度的增加量之间的预定关系，从测量的溶解氧浓度的增加量计算清洗液的溶解氮浓度。

    DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD, SUBSTRATE CLEANING METHOD, AND SUBSTRATE CLEANING APPARATUS
    5.
    发明申请
    DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD, SUBSTRATE CLEANING METHOD, AND SUBSTRATE CLEANING APPARATUS 有权
    溶解氮浓度监测方法，基板清洗方法和基板清洗装置

    公开(公告)号：US20130263887A1

    公开(公告)日：2013-10-10

    申请号：US13995568

    申请日：2011-12-13

    申请人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

    IPC分类号： G01N29/02 ,  B08B3/12

    CPC分类号： G01N29/02 ,  B08B3/12 ,  H01L21/02052 ,  H01L21/67057 ,  H01L21/67253 ,  Y10T436/17 ,  Y10T436/176152 ,  Y10T436/20 ,  Y10T436/207497 ,  Y10T436/209163

    摘要： A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.

    摘要翻译： 溶解氮浓度监测方法用于在将超声波照射到其中浸渍了基材的清洗液上时，监测清洗液的溶解氮浓度。 该方法包括测量由于由超声波照射引起的自由基反应而由水分子产生的氧分子产生的清洗液的溶解氧浓度的增加量。 基于溶解的氮浓度与溶解氧浓度的增加量之间的预定关系，从测量的溶解氧浓度的增加量计算清洗液的溶解氮浓度。

    CLEANING APPARATUS, EQUIPMENT, AND METHOD
    6.
    发明申请
    CLEANING APPARATUS, EQUIPMENT, AND METHOD 审中-公开
    清洁装置，设备和方法

    公开(公告)号：US20130192628A1

    公开(公告)日：2013-08-01

    申请号：US13618426

    申请日：2012-09-14

    申请人： Yoshihiro Mori ,  Teruo Haibara ,  Etsuko Kubo ,  Masashi Uchibe

    发明人： Yoshihiro Mori ,  Teruo Haibara ,  Etsuko Kubo ,  Masashi Uchibe

    IPC分类号： B08B3/12 ,  B08B7/02

    CPC分类号： B08B3/12 ,  B08B3/10

    摘要： A cleaning apparatus for cleaning an object includes a cleaning tank holding a cleaning liquid, the object being cleanable by the cleaning liquid. A coupling tank holding an intermediate medium is in contact with a portion of the cleaning tank. An ultrasonic wave generation unit is disposed at the coupling tank and configured to ultrasonically vibrate the cleaning liquid via the intermediate medium. A modification unit is configured to modify a difference in sonic velocity between the cleaning liquid and the intermediate medium.

    摘要翻译： 用于清洁物体的清洁设备包括保持清洁液体的清洁罐，该物体可被清洁液体清洁。 保持中间介质的联接罐与清洗槽的一部分接触。 超声波发生单元设置在耦合槽处，构造成经由中间介质超声振动清洗液。 修改单元被配置为修改清洁液体和中间介质之间的声速差。

    CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD
    7.
    发明申请
    CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD 有权
    清洁装置，测量方法和校准方法

    公开(公告)号：US20130112900A1

    公开(公告)日：2013-05-09

    申请号：US13618624

    申请日：2012-09-14

    申请人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    IPC分类号： G01N21/70

    CPC分类号： G01N21/274 ,  G01N21/70 ,  G01N21/71 ,  G01N29/2418 ,  G01N2021/8416

    摘要： A calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid includes varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak. The liquid is illuminated with ultrasonic waves while varying the concentration of the gas in the liquid and a measured value is measured, using the measurement device, as a concentration of the gas in the liquid when the intensity of the luminescence shows a peak. The measurement device is calibrated based on the measured value and the reference concentration.

    摘要翻译： 用于校准用于测量溶解在液体中的气体的浓度的测量装置的校准方法包括改变溶解在液体中的气体的浓度，并且预先确定作为参考浓度的发光强度的气体的浓度 当用超声波照射液体时产生峰值。 在改变液体中的气体浓度的同时，用超声波照射液体，并且当发光强度显示峰值时，使用测量装置测量液体中气体的浓度的测量值。 测量装置根据测量值和参考浓度进行校准。