公开(公告)号：US07340706B2

公开(公告)日：2008-03-04

申请号：US11239977

申请日：2005-09-30

申请人： Ilya Golubtsov ,  Stanislav V. Aleshin ,  Ranko Scepanovic ,  Sergei Rodin ,  Marina Medvedeva ,  Sergey V. Uzhakov ,  Evgueny E. Egorov ,  Nadya Strelkova

发明人： Ilya Golubtsov ,  Stanislav V. Aleshin ,  Ranko Scepanovic ,  Sergei Rodin ,  Marina Medvedeva ,  Sergey V. Uzhakov ,  Evgueny E. Egorov ,  Nadya Strelkova

IPC分类号： G06F17/50

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F7/705

摘要： The present invention provides a method and system for analyzing the quality of an OPC mask. The method includes receiving a target layer from a target design, receiving an OPC mask layer from the OPC mask. The method also includes classifying each cell of at least one of the target layer and the OPC mask layer as either repeating or non-repeating, and for each repeating cell, recognizing geometric points in the target layer to determine quality measuring groups. The method also includes simulating the OPC mask layer based on the quality measuring groups, measuring edge placement errors (EPEs) based on at least one of the geometric points, and providing an EPE layer representing EPEs greater than an EPE threshold.

摘要翻译： 本发明提供了一种用于分析OPC掩模的质量的方法和系统。 该方法包括从目标设计接收目标层，从OPC掩模接收OPC掩模层。 该方法还包括将目标层和OPC掩模层中的至少一个的每个单元分类为重复的或不重复的，并且对于每个重复的单元，识别目标层中的几何点以确定质量测量组。 该方法还包括基于质量测量组模拟OPC掩模层，基于至少一个几何点测量边缘放置误差（EPE），以及提供表示大于EPE阈值的EPE的EPE层。

公开(公告)号：US06898780B2

公开(公告)日：2005-05-24

申请号：US10327314

申请日：2002-12-20

申请人： Evgueny E. Egorov ,  Stanislav V. Aleshin ,  Ranko Scepanovic

发明人： Evgueny E. Egorov ,  Stanislav V. Aleshin ,  Ranko Scepanovic

IPC分类号： G03F1/00 ,  G03F1/36 ,  G06F17/50

CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/5081

摘要： A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) chip design is disclosed. The system and method of the present invention includes exploding calls on an element list to generate an expanded element list, defining a local cover area for each call on the expanded element list, classifying congruent local cover areas into corresponding groups, and performing an OPC procedure for one local cover area in each group By defining the local cover area for each call and grouping congruent local cover areas, only one OPC procedure (e.g., evaluation and correction) needs to be performed per group of congruent local cover areas. The amount of data to be evaluated and the number of corrections performed is greatly reduced because OPC is not performed on repetitive portions of the IC chip design, thereby resulting in significant savings in computing resources and time.

摘要翻译： 公开了一种在集成电路（IC）芯片设计上执行光学邻近校正（OPC）的方法和系统。 本发明的系统和方法包括在元素列表上爆炸呼叫以生成扩展元素列表，为扩展元素列表上的每个呼叫定义局部覆盖区域，将全局局部覆盖区域分类成对应的组，以及执行OPC过程 每个组中的一个局部覆盖区域通过定义每个呼叫的局部覆盖区域并对同一个局部覆盖区域进行分组，需要对每组一致的局部覆盖区域执行一个OPC过程（例如，评估和校正）。 由于不对IC芯片设计的重复部分执行OPC，所以要评估的数据量和校正次数大大降低，从而大大节省了计算资源和时间。

公开(公告)号：US06813758B2

公开(公告)日：2004-11-02

申请号：US10097419

申请日：2002-03-14

申请人： Stanislav V. Aleshin ,  Evgueny E. Egorov ,  Marina Medvedeva

发明人： Stanislav V. Aleshin ,  Evgueny E. Egorov ,  Marina Medvedeva

IPC分类号： G06F1750

CPC分类号： G06F17/5081

摘要： The present invention is directed to an optical proximity correction driven hierarchy. A method for constructing a hierarchy of optically independent structures for use in optical proximity correction of a circuit may include receiving an integrated circuit design, the design including geometric circuit elements for providing circuit functions of an integrated circuit. At least a portion of the integrated circuit design is exploded and geometric circuit elements of the exploded integrated circuit design are gathered into optically independent classes. A search is then performed for congruency for each optically independent class.

摘要翻译： 本发明涉及光学邻近校正驱动层级。 用于构建用于电路的光学邻近校正的光学独立结构的层级的方法可以包括接收集成电路设计，该设计包括用于提供集成电路的电路功能的几何电路元件。 集成电路设计的至少一部分被分解，并且分解集成电路设计的几何电路元件被聚集到光学独立的类中。 然后对于每个光学独立的类执行一致的搜索。

公开(公告)号：US06785871B2

公开(公告)日：2004-08-31

申请号：US10225909

申请日：2002-08-21

申请人： Sergei Rodin ,  Evgueny E. Egorov ,  Stanislav V. Aleshin

发明人： Sergei Rodin ,  Evgueny E. Egorov ,  Stanislav V. Aleshin

IPC分类号： G06F1750

CPC分类号： G06F17/5081 ,  G06T7/0002 ,  G06T7/49 ,  G06T7/68 ,  G06T2207/30148

摘要： A method of finding an optically periodic structure in a cell layer of an integrated circuit design includes receiving as input a physical representation of a cell layer of an integrated circuit design, finding reference coordinates of a selected portion of the cell layer from the physical representation of a cell layer, selecting an initial element located nearest to the reference coordinates, and constructing a base structure that includes the initial element and a minimum number of elements in the physical representation of the cell layer wherein the base structure may be replicated at an X-offset and a Y-offset to fill the entire selected portion so that for each element in each replica of the base structure there is an identical element at identical coordinates in the physical representation of the cell layer.

摘要翻译： 在集成电路设计的单元层中找到光学周期性结构的方法包括：接收作为输入的集成电路设计的单元层的物理表示，从所述单元层的物理表示中找到所述单元层的选定部分的参考坐标 选择最靠近所述参考坐标的初始元素，以及构建基本结构，所述基本结构包括所述单元层的所述物理表示中的所述初始元素和最小数量的元素，其中所述基本结构可以在X- 偏移和Y偏移以填充整个所选择的部分，使得对于基本结构的每个副本中的每个元素，在单元层的物理表示中的相同坐标处存在相同的元素。