公开(公告)号：US09947502B2

公开(公告)日：2018-04-17

申请号：US15147394

申请日：2016-05-05

Applicant: Excillum AB

Inventor： Oscar Hemberg ,  Tomi Tuohimaa ,  Björn Sundman

IPC: H05G1/52 ,  H01J35/14 ,  H01J35/08

CPC classification number: H01J35/14 ,  H01J35/08 ,  H01J2235/082 ,  H05G1/52

Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.