公开(公告)号：US09530607B2

公开(公告)日：2016-12-27

申请号：US14457385

申请日：2014-08-12

Applicant: EXCILLUM AB

Inventor： Oscar Hemberg ,  Tomi Tuohimaa ,  Mikael Otendal

IPC: H01J35/02 ,  H01J35/08 ,  G03F7/20 ,  H01J35/12 ,  H05G2/00

CPC classification number: H01J35/08 ,  G03F7/70033 ,  H01J35/12 ,  H01J2235/082 ,  H01J2235/1204 ,  H01J2235/1279 ,  H05G2/003 ,  H05G2/008

Abstract: Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump. The pressurized liquid metal is then conducted to a nozzle and ejected into a vacuum chamber in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir, and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump, suitable for the inlet of the high-pressure pump. Also, a corresponding circulation system and an X-ray source provided with such circulation system.

Abstract translation: 提出了用于将液体金属提供到电子束将冲击液态金属以产生X射线的相互作用区域的闭环循环。 在一种方法中，使用高压泵将液态金属的压力提高至至少10巴。 然后将加压液体金属传导到喷嘴并以空间连续射流的形式喷射到真空室中。 在通过真空室之后，将液态金属收集在收集容器中，并且将液态金属的压力升高到入口压力，例如， 使用底漆泵，适用于高压泵的入口。 另外，具有这样的循环系统的相应的循环系统和X射线源。

公开(公告)号：US09947502B2

公开(公告)日：2018-04-17

申请号：US15147394

申请日：2016-05-05

Applicant: Excillum AB

Inventor： Oscar Hemberg ,  Tomi Tuohimaa ,  Björn Sundman

IPC: H05G1/52 ,  H01J35/14 ,  H01J35/08

CPC classification number: H01J35/14 ,  H01J35/08 ,  H01J2235/082 ,  H05G1/52

Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.