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公开(公告)号:US20230258487A1
公开(公告)日:2023-08-17
申请号:US18300978
申请日:2023-04-14
Inventor: Lang FENG , Stefan S. NATU , John J. VALENZA, II
Abstract: Systems for examining a material comprising: an electromagnetic radiation source; a dielectric contrast analysis structure comprising: a bulk dielectric substance; a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the dielectric contrast analysis structure is between the electromagnetic radiation source and the electromagnetic radiation detector. Wherein the plurality of receptacles are substantially parallel with one another and are disposed in a dielectric contrast analysis structure that is disposed in a pipe. Wherein the dielectric contrast analysis structure comprises: a bulk dielectric substance having a first end, a second end, and the plurality of receptacles disposed within the bulk dielectric substance, wherein a flow path of the material through the receptacles is from the first end of the bulk dielectric substance to the second end of the bulk dielectric substance.