公开(公告)号：US20230162945A1

公开(公告)日：2023-05-25

申请号：US17989550

申请日：2022-11-17

申请人： FEI Company

发明人： Jaroslav Velcovský ,  Jirí Kutálek ,  Radek Smolka ,  Jirí Vítecek ,  Bronislav Pribyl ,  Dávid Pacura

IPC分类号： H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147 ,  H01J37/30 ,  B23K26/38

CPC分类号： H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/1471 ,  H01J37/3005 ,  B23K26/38 ,  H01J2237/31749 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/1506 ,  H01J2237/2803

摘要： The invention relates to method of milling and imaging a sample. The method comprises the step of providing an imaging system, as well as a milling beam source. The method comprises the steps of milling, using a milling beam from said milling beam source, a sample to remove a layer of the sample; and imaging, using said imaging system, an exposed surface of the sample. As defined herein, the method further comprises the step of determining a relative position of said sample, and using said determined relative position of said sample in said milling step for positioning said sample relative to said milling beam. The relative position of said sample can be a working distance with respect to the imaging system, which can be determined by means of an autofocus procedure.