POLISHING PAD AND METHOD FOR PRODUCING POLISHING PAD
    2.
    发明申请
    POLISHING PAD AND METHOD FOR PRODUCING POLISHING PAD 审中-公开
    抛光垫及其制造方法

    公开(公告)号:US20150068129A1

    公开(公告)日:2015-03-12

    申请号:US14385894

    申请日:2013-03-26

    IPC分类号: B24B37/24

    摘要: Provided are a method for producing a finish polishing pad and the polishing pad which allow formation of a stable film and enables polishing with fewer polishing scratches. The method comprises the steps of: dissolving a composition for forming polyurethane resin film containing a polyurethane resin and an additive(s) in a solvent capable of dissolving the resin; removing an insoluble component(s) to make the content of the insoluble component(s) in the solution less than 1% by mass relative to the total mass of the composition; adding a poor solvent to the solution from which the insoluble component(s) has(have) been removed, followed by mixing, the amount of the poor solvent added being calculated according to a defined Formula 1; and forming a film from the mixture solution on the film formation substrate by a wet coagulation method, to thereby form the polyurethane resin film.

    摘要翻译: 提供一种用于制造精抛光垫和抛光垫的方法,其能够形成稳定的膜并且能够以较少的抛光划痕进行抛光。 该方法包括以下步骤:将含有聚氨酯树脂和添加剂的聚氨酯树脂膜的组合物溶解在能够溶解树脂的溶剂中; 除去不溶性组分以使溶液中的不溶性组分的含量相对于组合物的总质量小于1质量%; 向不溶性成分(已经)除去的溶液中加入不良溶剂,然后混合,加入的不良溶剂的量根据定义的式1计算; 并通过湿式凝结法从成膜基材上的混合溶液中形成膜,从而形成聚氨酯树脂膜。