公开(公告)号：US20240149390A1

公开(公告)日：2024-05-09

申请号：US18278405

申请日：2022-03-18

申请人： FUJIBO HOLDINGS, INC.

发明人： Yoshihide KAWAMURA ,  Teppei TATENO ,  Hiroshi KURIHARA ,  Satsuki YAMAGUCHI ,  Yamato TAKAMIZAWA ,  Keisuke OCHI ,  Tetsuaki KAWASAKI

IPC分类号： B24B37/22

CPC分类号： B24B37/22

摘要： Provided is a polishing pad comprising a polishing layer made of a polyurethane resin foam containing an isocyanate-terminated prepolymer, and a curing agent, wherein the ratio (NC80/NC40) of a weight proportion (NC80) of an amorphous phase content in the polishing layer measured at 80° C. by a pulsed NMR method to a weight proportion (NC40) of the amorphous phase content in the polishing layer measured at 40° C. by the pulsed NMR method is between 1.5 and 2.5.

公开(公告)号：US20230415300A1

公开(公告)日：2023-12-28

申请号：US18247158

申请日：2021-09-16

申请人： Fujibo Holdings, Inc.

发明人： Teppei TATENO ,  Keisuke TANAKA ,  Yoshie KIRAKU ,  Kenichi KOIKE ,  Hiroshi KURIHARA ,  Yoshiki MIYAUCHI

IPC分类号： B24B37/24 ,  B24B37/26 ,  C08J7/056 ,  B24D3/22

CPC分类号： B24B37/24 ,  B24D3/22 ,  C08J7/056 ,  B24B37/26

摘要： The present invention provides a polishing pad that can suppress variations in light transmittance or a polishing pad that can reduce adhesion and sticking of polishing swarf to the surface on the polishing surface side of the light-transmitting resin member (window member).

公开(公告)号：US09370853B2

公开(公告)日：2016-06-21

申请号：US14570789

申请日：2014-12-15

申请人： Fujibo Holdings, Inc.

发明人： Kouki Itoyama ,  Motofumi Suzuki

IPC分类号： B24B37/20 ,  B24B37/14 ,  H01L21/304 ,  B24B37/24 ,  H01L21/02 ,  H01L29/16

CPC分类号： B24B37/14 ,  B24B37/24 ,  H01L21/02013 ,  H01L21/304 ,  H01L29/1608

摘要： The present invention provides a lapping plate, which provides a high lapping rate and also can suppress the generation of scratches on a surface of a polishing workpiece. The present invention provides a resin lapping plate comprising a resin sheet comprising a thermosetting polyurethane resin and having an opening rate of 10 to 50% and a Young's modulus of 7.0×107 to 5.0×108 N/m2.

摘要翻译： 本发明提供一种研磨板，其提供高的研磨速度，并且还可以抑制在抛光工件的表面上产生划痕。 本发明提供一种树脂研磨板，其包含热固性聚氨酯树脂的树脂片，其开口率为10〜50％，杨氏模量为7.0×10 7×10 8×10 N / m 2。

公开(公告)号：US20230173637A1

公开(公告)日：2023-06-08

申请号：US17912937

申请日：2021-03-19

申请人： FUJIBO HOLDINGS, INC.

发明人： Teppei TATENO ,  Ryuma MATSUOKA ,  Hiroshi KURIHARA ,  Satsuki NARUSHIMA ,  Yamato TAKAMIZAWA

IPC分类号： B24B37/22

CPC分类号： B24B37/22

摘要： Provided is a polishing unit that can reduce penetration of a polishing slurry into a base material layer and that can prevent impairment in polishing performance. A polishing unit (10a) in accordance with a first aspect of the present invention includes: a polishing pad (100a) that includes a polishing layer (101) and a base material layer (103); and a surface plate (150), the base material layer (103) having a diameter smaller than a diameter of the polishing layer (101) and greater than a diameter of the surface plate (150).

公开(公告)号：US20210347006A1

公开(公告)日：2021-11-11

申请号：US17278540

申请日：2019-09-27

申请人： FUJIBO HOLDINGS, INC.

发明人： Ryuma MATSUOKA ,  Hiroshi KURIHARA ,  Satsuki NARUSHIMA ,  Yamato TAKAMIZAWA

IPC分类号： B24B37/24 ,  B24B37/22

摘要： An object is to provide a polishing pad that can reduce generation of scratches, and a method for producing a polished product. A polishing pad including a polyurethane sheet as a polishing layer, wherein the polyurethane sheet exhibits a peak of loss tangent tan δ in the range from 40 to 60° C. in dynamic viscoelasticity measurement performed under conditions of a frequency of 1.6 Hz and a temperature of 20 to 100° C. in a water immersion condition.

公开(公告)号：US20200331115A1

公开(公告)日：2020-10-22

申请号：US16305279

申请日：2017-05-29

申请人： FUJIBO HOLDINGS, INC.

发明人： Shin TOKUSHIGE ,  Keisuke NAKASE ,  Hiroshi KASHIWADA ,  Tatsuya YAMADA ,  Yousuke NARADA ,  Kenichi KOIKE

IPC分类号： B24B37/04 ,  B24B37/24

摘要： A polishing pad comprising a knitted fabric constituted by warp knitting or weft knitting, and a resin with which the knitted fabric is impregnated, and having a cross section cut in a surface direction of the knitted fabric, as a polishing surface.

公开(公告)号：US10213895B2

公开(公告)日：2019-02-26

申请号：US14902060

申请日：2014-07-01

申请人： FUJIBO HOLDINGS, INC.

发明人： Hiroshi Kashiwada ,  Kenichi Koike ,  Shin Tokushige

IPC分类号： B24B37/24 ,  H01L21/02 ,  H01L21/322 ,  B24D3/28

摘要： A polishing pad comprising a resin-containing polishing cloth having a polishing cloth base impregnated with a polyurethane resin and silicon carbide, wherein the silicon carbide has a particle diameter in a range from 0.2 to 3.0 μm, and the content of the silicon carbide in the resin-containing polishing cloth is in a range from 60 to 500 parts by mass relative to 100 parts by mass of the polishing cloth base.

公开(公告)号：US10071460B2

公开(公告)日：2018-09-11

申请号：US14385894

申请日：2013-03-26

申请人： FUJIBO HOLDINGS, INC.

发明人： Teppei Tateno ,  Hirohito Miyasaka ,  Ryuma Matsuoka ,  Yoshie Kanazawa ,  Fumio Miyazawa

IPC分类号： B24B1/00 ,  B24D3/00 ,  B24B37/24 ,  C08G18/48 ,  C08G18/76 ,  C08G18/42 ,  C08G18/44 ,  C08L75/04 ,  C08L75/06

CPC分类号： B24B37/24 ,  C08G18/4238 ,  C08G18/44 ,  C08G18/4825 ,  C08G18/4854 ,  C08G18/7671 ,  C08L75/04 ,  C08L75/06

摘要： Provided are a method for producing a finish polishing pad and the polishing pad which allow formation of a stable film and enables polishing with fewer polishing scratches. The method includes the steps of: dissolving a composition for forming polyurethane resin film containing a polyurethane resin and an additive(s) in a solvent capable of dissolving the resin; removing an insoluble component(s) to make the content of the insoluble component(s) in the solution less than 1% by mass relative to the total mass of the composition; adding a poor solvent to the solution from which the insoluble component(s) has(have) been removed, followed by mixing, the amount of the poor solvent added being calculated according to a defined Formula 1; and forming a film from the mixture solution on the film formation substrate by a wet coagulation method, to thereby form the polyurethane resin film.

公开(公告)号：US20240149389A1

公开(公告)日：2024-05-09

申请号：US18282165

申请日：2021-03-22

申请人： FUJIBO HOLDINGS, INC.

发明人： Teppei TATENO ,  Ryuma MATSUOKA ,  Hiroshi KURIHARA ,  Satsuki YAMAGUCHI ,  Yamato TAKAMIZAWA

IPC分类号： B24B37/04 ,  C08J5/18 ,  C08J9/00 ,  C08J9/18

CPC分类号： B24B37/042 ,  C08J5/18 ,  C08J9/0061 ,  C08J9/18 ,  C08J2203/22 ,  C08J2375/08 ,  C08J2433/20 ,  H01L21/30625

摘要： A polishing pad including a polyurethane sheet as a polishing layer, wherein the polyurethane sheet has a ratio (E′B40/E′T40) of a storage elastic modulus E′B40 at 40° C. in dynamic viscoelasticity measurement performed under a bending mode condition with a frequency of 1.6 Hz to a storage elastic modulus E′T40 at 40° C. in dynamic viscoelasticity measurement performed under a tension mode condition with a frequency of 1.6 Hz of 0.60 to 1.60.

公开(公告)号：US11883925B2

公开(公告)日：2024-01-30

申请号：US17040638

申请日：2019-03-19

申请人： Fujibo Holdings, Inc.

发明人： Ryuma Matsuoka ,  Hiroshi Kurihara ,  Satsuki Narushima ,  Yamato Takamizawa

IPC分类号： B24B37/24

CPC分类号： B24B37/24

摘要： A polishing pad is equipped with a polishing layer having a polyurethane sheet, wherein a tan δ peak value change rate determined by formula: tan δ peak value change rate=|tan δ peakwet−tan δ peakdry|/tan δ peakdry×100, is not more than 15%, where tan δ peakwet represents the peak value of the loss tangent tan δ, of the polyurethane sheet in a wet state after being immersed in water for three days, within a temperature range of 20-100° C. in a tensile mode under an initial load of 148 g with a strain range of 0.1% at a measurement frequency of 1.6 Hz, and tan δ peakdry represents the peak value of the loss tangent tan δ, of the polyurethane sheet in a dry state without being immersed in water, within a temperature range of 20-100° C. in a tensile mode under an initial load of 148 g with a strain range of 0.1% at a measurement frequency of 1.6 Hz.