公开(公告)号：US20130224895A1

公开(公告)日：2013-08-29

申请号：US13861714

申请日：2013-04-12

Applicant: FUJIFILM Corporation

Inventor： Tetsuo KAWANO ,  Hiroshi ARAI

IPC: H01L31/18

CPC classification number: H01L31/18 ,  C23C18/1632 ,  C23C18/1678 ,  H01L21/67103 ,  H01L31/0322 ,  H01L31/0749 ,  Y02E10/541 ,  Y02P70/521

Abstract: A support-heat unit that supports and heats a substrate from the back side of the substrate, a reaction bath having an opening for supplying a CBD reaction solution for forming a film onto a front surface of the substrate, which is supported by the support-heat unit, and a reaction bath forward-backward drive unit that can press the opening onto the front surface of the substrate by moving the reaction bath toward the front surface of the substrate, which is supported by the support-heat unit, and that can detach the opening from the front surface of the substrate by moving the reaction bath away from the front surface of the substrate are provided.

Abstract translation: 一种支撑加热单元，其从所述基板的背面支撑和加热基板;反应槽，具有用于向所述基板的前表面供应用于形成膜的CBD反应溶液的开口，所述反应槽由所述支撑 - 加热单元和反应槽前后驱动单元，其可以通过将反应槽朝向由支撑加热单元支撑的基板的前表面移动而将开口压向基板的前表面，并且可以 提供了通过使反应槽远离基板的前表面从基板的前表面分离开口。

公开(公告)号：US20140186988A1

公开(公告)日：2014-07-03

申请号：US14196338

申请日：2014-03-04

Applicant: FUJIFILM Corporation

Inventor： Tetsuo KAWANO ,  Hiroshi ARAI

IPC: H01L31/18

CPC classification number: H01L31/18 ,  H01L31/0296 ,  H01L31/0749 ,  Y02E10/541

Abstract: A chemical bath deposition apparatus includes: a reaction vessel for containing a reaction solution for chemical bath deposition to form a film on a surface of a substrate; a substrate holding section for holding the substrate such that at least the surface of the substrate contacts the reaction solution, the substrate holding section including a fixing surface made of stainless steel on which a back side of the substrate is closely fixed; a heater disposed at a rear side of the fixing surface, the heater heating the substrate from the back side of the substrate; and a reaction solution temperature control unit for controlling temperature of the reaction solution in the reaction vessel.

Abstract translation: 化学浴沉积装置包括：反应容器，用于容纳用于化学浴沉积的反应溶液以在基材的表面上形成膜; 用于保持基板的基板保持部，使得至少基板的表面与反应溶液接触，所述基板保持部具有由基板的背面紧密固定的不锈钢制的固定面， 设置在所述固定面的后侧的加热器，所述加热器从所述基板的背面加热所述基板; 以及用于控制反应容器中的反应溶液的温度的反应溶液温度控制单元。