公开(公告)号：US20200159117A1

公开(公告)日：2020-05-21

申请号：US16748285

申请日：2020-01-21

Applicant: FUJIFILM Corporation

Inventor： Ryo NISHIO ,  Akira Takada ,  Akiyoshi Goto ,  Naohiro Tango ,  Kazuhiro Marumo ,  Keiyu O

IPC: G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.

公开(公告)号：US11579528B2

公开(公告)日：2023-02-14

申请号：US16748285

申请日：2020-01-21

Applicant: FUJIFILM Corporation

Inventor： Ryo Nishio ,  Akira Takada ,  Akiyoshi Goto ,  Naohiro Tango ,  Kazuhiro Marumo ,  Keiyu O

IPC: G03F7/039 ,  G03F7/30 ,  G03F7/20

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.

公开(公告)号：US20200183274A1

公开(公告)日：2020-06-11

申请号：US16783350

申请日：2020-02-06

Applicant: FUJIFILM Corporation

Inventor： Naohiro TANGO ,  Akiyoshi GOTO ,  Keiyu O ,  Kazuhiro Marumo ,  Ryo NISHIO ,  Akira TAKADA

IPC: G03F7/004 ,  G03F7/039 ,  C08L25/08 ,  G03F7/20 ,  G03F7/32

Abstract: A photosensitive resin composition includes a resin, a photoacid generator, a solvent, and a low-molecular-weight ester compound, in which low-molecular-weight ester compound has alkali degradability and has a molecular weight of less than 1,500, and a content of the low-molecular-weight ester compound is from 0.1% by mass to 6% by mass with respect to the total solid content of the composition.