公开(公告)号：US20200183274A1

公开(公告)日：2020-06-11

申请号：US16783350

申请日：2020-02-06

Applicant: FUJIFILM Corporation

Inventor： Naohiro TANGO ,  Akiyoshi GOTO ,  Keiyu O ,  Kazuhiro Marumo ,  Ryo NISHIO ,  Akira TAKADA

IPC: G03F7/004 ,  G03F7/039 ,  C08L25/08 ,  G03F7/20 ,  G03F7/32

Abstract: A photosensitive resin composition includes a resin, a photoacid generator, a solvent, and a low-molecular-weight ester compound, in which low-molecular-weight ester compound has alkali degradability and has a molecular weight of less than 1,500, and a content of the low-molecular-weight ester compound is from 0.1% by mass to 6% by mass with respect to the total solid content of the composition.

公开(公告)号：US20240402601A1

公开(公告)日：2024-12-05

申请号：US18798237

申请日：2024-08-08

Applicant: FUJIFILM Corporation

Inventor： Minoru UEMURA ,  Masafumi Kojima ,  Akiyoshi Goto ,  Nishiki Fujimaki ,  Nobuhiro Hiura ,  Kazuhiro Marumo ,  Takahiro Mori ,  Michihiro Shirakawa

IPC: G03F7/004 ,  C07C311/51 ,  C07C381/12 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (Q) represented by a formula (I-1) below and a resin having a polarity that increases through decomposition by an action of an acid, wherein, in the formula (I-1), R1 represents a hydrocarbon group having at least one or more fluorine atoms, R2 represents an aromatic group, Y represents —SO2— or —CO—, and X+ represents a counter cation.

公开(公告)号：US20190171104A1

公开(公告)日：2019-06-06

申请号：US16266719

申请日：2019-02-04

Applicant: FUJIFILM Corporation

Inventor： Akira Takada ,  Ryo Nishio ,  Akiyoshi Goto ,  Michihiro Shirakawa ,  Naohiro Tango ,  Kazuhiro Marumo ,  Kyohei Sakita

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C08L33/14

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (I), A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, in Formula (I), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(═O)CH2—. R11 and R12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.

公开(公告)号：US12216404B2

公开(公告)日：2025-02-04

申请号：US17106170

申请日：2020-11-29

Applicant: FUJIFILM Corporation

Inventor： Masafumi Kojima ,  Minoru Uemura ,  Takashi Kawashima ,  Akiyoshi Goto ,  Kei Yamamoto ,  Kazuhiro Marumo ,  Keiyu Ou

IPC: G03F7/039 ,  C08L33/10 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of −1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than −1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.

公开(公告)号：US20220334476A1

公开(公告)日：2022-10-20

申请号：US17591943

申请日：2022-02-03

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Aina Ushiyama ,  Akiyoshi Goto ,  Michihiro Shirakawa ,  Keita Kato ,  Kazuhiro Marumo ,  Hironori Oka

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C311/51 ,  C07C311/48 ,  C07C309/12 ,  C07C309/17

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).

公开(公告)号：US12235579B2

公开(公告)日：2025-02-25

申请号：US17548595

申请日：2021-12-13

Applicant: FUJIFILM Corporation

Inventor： Keiyu Ou ,  Naohiro Tango ,  Kei Yamamoto ,  Kazuhiro Marumo

IPC: G03F7/004 ,  C07C309/17 ,  C07C309/42 ,  C07C311/09 ,  C07C311/48 ,  C07C311/51 ,  C07C381/12 ,  C07D327/06 ,  C07D327/08 ,  C07D333/46 ,  C07D333/76 ,  C08F220/18 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

公开(公告)号：US11584810B2

公开(公告)日：2023-02-21

申请号：US16266719

申请日：2019-02-04

Applicant: FUJIFILM Corporation

Inventor： Akira Takada ,  Ryo Nishio ,  Akiyoshi Goto ,  Michihiro Shirakawa ,  Naohiro Tango ,  Kazuhiro Marumo ,  Kyohei Sakita

IPC: G03F7/039 ,  G03F7/20 ,  C08F20/24 ,  G03F7/004 ,  G03F7/32 ,  C08F20/26 ,  G03F7/11 ,  C08F220/18 ,  C08L33/14

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (1). A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, in Formula (1), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(═O)CH2—. R11 and R12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.

公开(公告)号：US20200159117A1

公开(公告)日：2020-05-21

申请号：US16748285

申请日：2020-01-21

Applicant: FUJIFILM Corporation

Inventor： Ryo NISHIO ,  Akira Takada ,  Akiyoshi Goto ,  Naohiro Tango ,  Kazuhiro Marumo ,  Keiyu O

IPC: G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.

公开(公告)号：US11579528B2

公开(公告)日：2023-02-14

申请号：US16748285

申请日：2020-01-21

Applicant: FUJIFILM Corporation

Inventor： Ryo Nishio ,  Akira Takada ,  Akiyoshi Goto ,  Naohiro Tango ,  Kazuhiro Marumo ,  Keiyu O

IPC: G03F7/039 ,  G03F7/30 ,  G03F7/20

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.

公开(公告)号：US11029597B2

公开(公告)日：2021-06-08

申请号：US16112003

申请日：2018-08-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Kazuhiro Marumo

IPC: G03F7/00 ,  H01L21/308 ,  H01L21/311 ,  B81C1/00 ,  G03F7/027 ,  H01L21/027 ,  B82Y40/00 ,  G03F7/075

Abstract: Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.