METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION

    公开(公告)号:US20220081518A1

    公开(公告)日:2022-03-17

    申请号:US17534397

    申请日:2021-11-23

    Abstract: A method for producing a radiation-sensitive resin composition includes a step 1 of putting at least a resin having a polarity that increases by an action of an acid, a photoacid generator, and a solvent into a stirring tank, and a step 2 of producing a radiation-sensitive resin composition by stirring and mixing the resin having a polarity that increases by the action of an acid, the photoacid generator, and the solvent in the stirring tank under a gas having an inert gas concentration of 90% by volume or more, in which in the step 2, an atmospheric pressure inside the stirring tank is higher than an atmospheric pressure outside the stirring tank, and in the step 2, a difference between the atmospheric pressure inside the stirring tank and the atmospheric pressure outside the stirring tank is 2.0 kPa or less.

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