公开(公告)号：US20210373438A1

公开(公告)日：2021-12-02

申请号：US17393889

申请日：2021-08-04

Applicant: FUJIFILM Corporation

Inventor： Kotaro TAKAHASHI ,  Yasunori Yonekuta ,  Taro Miyoshi

IPC: G03F7/004 ,  C07D235/18 ,  C07D277/66 ,  C07D263/57 ,  C08F212/14

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a solubility in a developer, which changes by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation; and an acid diffusion control agent, in which a molecular weight of the acid diffusion control agent is 420 or more, and a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of the air satisfies 15≤Ra≤45.

公开(公告)号：US20240027908A1

公开(公告)日：2024-01-25

申请号：US18476975

申请日：2023-09-28

Applicant: FUJIFILM Corporation

Inventor： Kotaro TAKAHASHI ,  Fumihiro Yoshino

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14

CPC classification number: G03F7/039 ,  G03F7/038 ,  G03F7/0045 ,  C08F212/24 ,  C08F212/30

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR and excellent resolution can be obtained, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin A including a repeating unit a represented by Formula (1), which has a photoacid generating group represented by Formula (c) in a side chain, and a repeating unit b having a group which is decomposed by action of acid to generate a polar group, in which a content of the repeating unit a is 0.40 to 1.50 mmol/g per a total solid content mass of the composition, the actinic ray-sensitive or radiation-sensitive resin composition further contains an acid diffusion control agent which is decomposed by irradiation with an actinic ray or a radiation to generate an acid having a pKa higher than a pKa of an acid generated from the photoacid generating group by 0.50 or more, and Qp obtained by Expression (d) is 0.40 to 1.00.