公开(公告)号：US20230279294A1

公开(公告)日：2023-09-07

申请号：US18177304

申请日：2023-03-02

申请人： FUJIFILM Corporation

发明人： Moe Narita ,  Nobuaki Sugimura

IPC分类号： C09K13/06 ,  C23F1/26 ,  C23F1/28 ,  H01L21/3213

CPC分类号： C09K13/06 ,  C23F1/26 ,  C23F1/28 ,  H01L21/32134

摘要： Objects of the present invention are to provide a composition having excellent dissolving ability for a transition metal-containing substance (particularly, a Ru-containing substance) and to provide a method for treating a substrate. The composition according to an embodiment of the present invention contains at least one iodic acid compound selected from the group consisting of periodic acid, iodic acid, and salts thereof, and a compound represented by Formula (1).