公开(公告)号：US20220025212A1

公开(公告)日：2022-01-27

申请号：US17311429

申请日：2019-12-12

Applicant: FUJIMI INCORPORATED

Inventor： Hiroyuki ISHIDA ,  Ryo WAKABAYASHI

IPC: C09G1/02

Abstract: There is provided a polishing composition which can be more suitably used for polishing a synthetic resin product or the like, and a polishing method for polishing a polishing object using a polishing composition. There is provided a polishing composition containing abrasives, 0.01% by mass or more and 15% by mass or less of a monovalent acid-aluminum salt, a pyrrolidone compound or a caprolactam compound, and water and having a pH of 7.0 or less.

公开(公告)号：US20190126130A1

公开(公告)日：2019-05-02

申请号：US16308404

申请日：2017-06-02

Applicant: FUJIMI INCORPORATED

Inventor： Hitoshi MORINAGA ,  Hiroyuki ISHIDA ,  Naoto MIYAMOTO

IPC: A63C5/12 ,  B63B35/81 ,  A63C1/30 ,  A63C1/42 ,  A63C5/04

Abstract: Provided are a sliding instrument having a low frictional resistance to the snow surface, the ice surface, or the water surface and having excellent sliding performance and a method for manufacturing the sliding instrument. A sliding instrument to slide on snow, ice, or water includes a sliding surface (1) to come into contact with the snow surface, the ice surface, or the water surface, and the sliding surface (1) has a surface roughness Ra of 1.0 μm or less. A method for manufacturing the sliding instrument includes polishing a sliding surface (1) using a polishing composition slurry containing abrasives to make the sliding surface (1) have a surface roughness Ra of 1.0 μm or less.