公开(公告)号：US20240153662A1

公开(公告)日：2024-05-09

申请号：US18261700

申请日：2022-01-21

申请人： FUSE ENERGY TECHNOLOGIES CORP.

发明人： Paul HARRIS ,  Ayan CHOUDHURY ,  Zahra SEIFOLLAHI MOGHADAM ,  Raymond GOLINGO ,  Jean-Christoph BTAICHE

IPC分类号： G21G1/00 ,  G21B1/03 ,  G21G1/06

CPC分类号： G21G1/001 ,  G21B1/03 ,  G21G1/06 ,  G21G2001/0036

摘要： Methods and systems for producing radionuclides by neutron activation are disclosed. A system for radionuclide production can include a compact plasma-based fusion neutron source, for example, a Z-pinch-based neutron source, configured to generate a neutron flux, and a target holder configured to hold a target comprising neutron-activatable nuclides, for example, 98Mo, where the target holder is arranged with respect to the compact plasma-based fusion neutron source to expose the target to the neutron flux and produce radionuclides, for example, 99Mo, through neutron activation of the neutron-activatable nuclides. In some embodiments, the target holder is configured to move the target along a circulation path arranged with respect to the plasma-based fusion neutron source during exposure of the target to the neutron flux.

公开(公告)号：US20240079151A1

公开(公告)日：2024-03-07

申请号：US18256760

申请日：2021-12-10

申请人： FUSE ENERGY TECHNOLOGIES CORP.

发明人： Raymond GOLINGO ,  Jean-Christoph BTAICHE ,  Paul HARRIS ,  Ayan CHOUDHURY ,  Zahra SEIFOLLAHI MOGHADAM ,  Pierre TOCHON

IPC分类号： G21B1/05 ,  H05H1/54

CPC分类号： G21B1/05 ,  H05H1/54 ,  G21B1/21

摘要： Plasma processing systems and methods for fusion power applications are disclosed. The system can include a plasma confinement device including a reaction chamber; a plasma formation and injection device configured to form a source plasma outside the reaction chamber and inject the source plasma inside the reaction chamber; and a power supply configured to supply power to the plasma confinement device to apply a voltage across the reaction chamber to compress the source plasma into a Z-pinch plasma capable of sustaining fusion reactions. The plasma confinement device can include an inner electrode surrounded by an outer electrode to define therebetween an acceleration region of the reaction chamber. The outer electrode can extend beyond the inner electrode to define an assembly region of the reaction chamber. The source plasma can be injected in the acceleration region and flowed into the assembly region to be compressed into the Z-pinch plasma.